Electron trapping in HfO2 layer deposited over a HF last treated silicon substrate

Sambuco Salomone, L.; Cassani, M.V.; Garcia-Inza, M.; Carbonetto, S.; Redin, E.; Campabadal, F.; Faigón, A.

doi:10.1016/j.mee.2024.112277

Microelectronic Engineering

2025

DOI: 10.1016/j.mee.2024.112277

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Electron trapping in HfO2 layer deposited over a HF last treated silicon substrate

L. Sambuco Salomone,

M.V. Cassani,

M. Garcia-Inza

et al.

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Electron trapping in HfO2 layer deposited over a HF last treated silicon substrate

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References 58 publications

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