2008
DOI: 10.1007/978-3-540-29003-2
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Elementary Physics of Complex Plasmas

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Cited by 265 publications
(206 citation statements)
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“…In dusty plasmas, the dust inclusions are charged due to charging by various processes; in laboratory plasmas, this is mostly by plasma currents [1][2][3]. The presence of dust charges affects the boundary condition for surface wave fields.…”
Section: Discussionmentioning
confidence: 99%
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“…In dusty plasmas, the dust inclusions are charged due to charging by various processes; in laboratory plasmas, this is mostly by plasma currents [1][2][3]. The presence of dust charges affects the boundary condition for surface wave fields.…”
Section: Discussionmentioning
confidence: 99%
“…Dispersion equation Forω in >ω h , the dependence ofñ 2 on ω 2 , see Fig. 1, shows the first, low frequency, branch starting from the host medium plasma frequencyω 2 h . This branch begins as the stan- dard plasma branch in the long-wavelength limit, however, then asymptotically approaches the (squared) resonance frequency ω 2 res (10) at whichñ 2 → +∞, and this frequency is associated with the surface plasmon resonances.…”
Section: The Wave Dispersionmentioning
confidence: 99%
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“…These fluxes affect plasma far from the grain, preventing it from reaching an equilibrium with the grain field, and hence affecting the grain shielding by the plasma in a qualitative way, compared to a non-absorbing (test) charged grain. This qualitative effect of absorption on the screening is important for interaction of dust grains in dust clouds, clusters and crystals [4], and for related phenomena such as phase transitions in complex plasma structures [5,6].…”
Section: Introductionmentioning
confidence: 99%
“…This attraction may play a crucial role in formation and sustaining of plasma dust clusters and crystals (see [1][2][3][4] and references therein). The attractive part appears due to the r −3 tail in the potential of the test charge far from the charge, which has the sign opposite to that of the test charge.…”
Section: Introductionmentioning
confidence: 99%