Enhanced diamond nucleation on copper substrates by employing an electrostatic self-assembly seeding process with modified nanodiamond particles

Liu, Xuezhang; Yu, Tao; Wei, Qiuping; Yu, Zhaoju; Xu, Xiangyang

doi:10.1016/j.colsurfa.2012.07.020

Cited by 32 publications

(28 citation statements)

References 39 publications

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“…Films were deposited on PS substrate after seeding pretreatment, in PDDA polymer solution and KCl colloidal solution containing 4 nm diamond particles 16,17 . The doping process consisted of an additional hydrogen line, passing through a bubbler containing B 2 O 3 dissolved in methanol, with boron/carbon ratio of 20000 ppm in solution.…”

Section: Methodsmentioning

confidence: 99%

Boron Doped Ultrananocrystalline Diamond Films on Porous Silicon: Morphological, Structural and Electrochemical Characterizations

et al. 2015

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Section: Methodsmentioning

confidence: 99%

Boron Doped Ultrananocrystalline Diamond Films on Porous Silicon: Morphological, Structural and Electrochemical Characterizations

et al. 2015

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“…In fact, a nearly full sedimentation of the suspension was observed after about 2 hours after completion of the ultrasonic agitation. On the other hand, it is commonly recognized that the so-called zeta potential 26,52 of the ND particles in suspension on the one hand and that of the substrate surface on the other hand determine the colloidal behavior and self-assembly of ND particles on the substrate surface. Opposite values (negative vs. positive, or vice versa) of the respective zeta potentials could be obtained by tailoring the substrate and ND particle surfaces with different functional groups.…”

Section: Interactions Between Substrate Surface and Nd Particlesmentioning

confidence: 99%

“…An electrostatic self-assembly seeding process with such modified ND particles on copper and SiO 2 substrates was reported. 25,26 Also, the deposition of two-dimensional monolayers of ND particles by combined ultracentrifugation and electrophoresis techniques has been shown lately. 27 Yet, no studies have been reported that focused on the (possible) relationship between the topography of the substrate surface and the assembly of ND particle seeds onto it.…”

Section: Of 36mentioning

confidence: 99%

“…This is in line with several recent reports that focused on the seeding of ND particles by electrostatic self-assembly. [24][25][26]51,52 Electrostatic grafting on substrates (with or without surface modification) can result in a very high density and uniformity of ND particles if a properly selected surface modification and fractionalization of the ND particles are employed to improve their dispersion and to separate those particles into a more narrow range of particle sizes. 26,52 Ideally, ND particles are anchored to the substrate surface as seeds of single grain size for NCD film growth, but it is well known that the formation of ND particle agglomerates is difficult to avoid.…”

Section: Interactions Between Substrate Surface and Nd Particlesmentioning

confidence: 99%

“…[24][25][26]51,52 Electrostatic grafting on substrates (with or without surface modification) can result in a very high density and uniformity of ND particles if a properly selected surface modification and fractionalization of the ND particles are employed to improve their dispersion and to separate those particles into a more narrow range of particle sizes. 26,52 Ideally, ND particles are anchored to the substrate surface as seeds of single grain size for NCD film growth, but it is well known that the formation of ND particle agglomerates is difficult to avoid. The formation of nanoparticle agglomerates on the metallic film surfaces in this study could be due to the direct embedding of such agglomerates being present in the alcoholic suspension itself and/or a re-agglomeration of well dispersed ND particles on the sample surfaces upon evaporation of the liquid 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 solution at the end of the ultrasonic pretreatment.…”

Section: Interactions Between Substrate Surface and Nd Particlesmentioning

confidence: 99%

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Metallic Seed Nanolayers for Enhanced Nucleation of Nanocrystalline Diamond Thin Films

et al. 2013

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ABSTRACT:The enhancement of the nucleation and subsequent growth of nanocrystalline diamond (NCD) films with a submicron thickness control on silicon substrates is demonstrated by using a sputter deposition of six different metallic (Cr, Mo, Nb, Ti, V, and W) seed nanolayers. The effectiveness of altered surface morphology and surface chemistry is discussed. We show that the number density of nanodiamond particles embedded on the nanorough metallic surfaces after an ultrasonic seeding step together with the dynamic surface chemistry during hot-filament chemical vapor deposition of diamond determine the nucleation kinetics, microstructure and surface topography of the NCD films. Overall, the smoothest NCD layer (root-mean-square roughness 10 nm) was obtained with the highest seed density of diamond nanoparticles anchored to the metallic (W) surface. In particular, the rapid carbide-forming metals Mo, Nb and W showed the highest number density of diamond crystallites formed during the NCD nucleation stage, which resulted in dense, uniform and very smooth NCD films. Much rougher NCD films (17-37 nm) were obtained on the Cr, Ti, and V nanolayers that did not form carbides rapidly.Importantly, the carbon phase purity of the grown NCD films remains unaffected by the presence of different metallic seed nanolayers. Furthermore, we have assessed that the metallic nanolayer surface morphology does not play a relevant role in the enhancement of the seeding step.

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Enhancement of surface electrical current on silicon via nanodiamond particles deposited by pulsed spray technique

Cicala

Massaro

Velardi

et al. 2015

Physica Status Solidi (a)

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The deposition of as‐received nanodiamond (ND) particles on silicon substrate was performed by the pulsed spray technique, using a dispersion of 250 nm ND in 1,2‐dichloroethane. A set of samples was sprayed by varying the number of pulses from 1 to 500. The morphology of the samples was characterized and monitored by means of optical, atomic force, and confocal microscopies. At a low number of pulses, sparse diamond particles were observed, whereas at a high number of pulses dense/quasi‐continuous ND layers were formed. The electrical conductivity measurements of surface silicon substrate evidenced a remarkable change for the presence of ND particles. This behavior is also found by theoretical simulations (finite element method). Finally, a comparison between the electrical resistances measured on these samples versus the pulse number and the inverse current density calculated as a function of the number of ND particles, showed a good agreement. The experimental results highlighted an increase of the electrical current by using a number of pulses <100, whereas the simulation results proved the enhancement of current density and its surface rectification by employing a specific number of particles. The current increased by increasing the temperature and during the heating–cooling cycles hysteresis was observed. (a) Scheme of the sprayed ND particles on silicon substrate, (b) 3D AFM image 5 × 5 μm2 of 10 pulses sample, (c) trends of measured R and calculated 1/J.

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Enhanced diamond nucleation on copper substrates by employing an electrostatic self-assembly seeding process with modified nanodiamond particles

Cited by 32 publications

References 39 publications

Boron Doped Ultrananocrystalline Diamond Films on Porous Silicon: Morphological, Structural and Electrochemical Characterizations

Boron Doped Ultrananocrystalline Diamond Films on Porous Silicon: Morphological, Structural and Electrochemical Characterizations

Metallic Seed Nanolayers for Enhanced Nucleation of Nanocrystalline Diamond Thin Films

Enhancement of surface electrical current on silicon via nanodiamond particles deposited by pulsed spray technique

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