“…1 and 2 indicate that the carbon nanotips and nanotubes are grown from carbon film depending on temperature, which are related to the ion bombardment and diffusion at different temperatures. During the growth of carbon nanotips and nanotubes, the reactive gases are ionized by plasma into the carbonaceous ions (such as CH 3 + , CH 2 + ) and the etching ions including nitrogenous and hydrogen ions (such as N + , NH + , H + ) [4,16]. When these ions bombard with the carbon film, the etching ions play a role in sputtering-etching of the carbon film deposited on silicon substrate, while the carbonaceous ions play a role in carbon deposition.…”