Enhancing the surface properties and functionalization of polymethyl methacrylate with atomic layer-deposited titanium(IV) oxide

Shahmohammadi, Mina; Pensa, Eleonora; Bhatia, Harshdeep; Yang, Bin; Jursich, Gregory; Takoudis, Christos G.

doi:10.1007/s10853-020-05274-2

Cited by 23 publications

(21 citation statements)

References 72 publications

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“…Figure 1 compares the experimental and calculated moles of adsorbed titanium in each ALD cycle. The experimental moles are found from the thickness of TiO 2 film deposited in the previously reported study [10]. In the given ALD condition [3], the water molecules act as co-reactant of the reaction throughout the initial cycles.…”

Section: Resultsmentioning

confidence: 99%

“…Beyond a specific number of cycles, the growth rate on both silicon reference and stand-alone silicon were the same. It was conjectured that after the formation of a relatively thick film on the PMMA surface, the water molecules were either depleted or trapped under the film, and their effect was diminished [10]. To support this assumption, we decided to calculate the precise amount of water molecules and theoretically support the hypothesis of water existence inside the ALD reactor.…”

Section: Introductionmentioning

confidence: 99%

“…Thus, the model is updated to contain the combination of silicon (Si) and silicon hydroxide (SiOH) as the substrate for ALD. The growth rate versus the number of cycles is modeled here (instead of growth rate versus precursor pulse times) [10]. The required ALD conditions and experimental data points are obtained from our previous study (Figure 2 in the reference) [10].…”

Section: Introductionmentioning

confidence: 99%

“…The growth rate versus the number of cycles is modeled here (instead of growth rate versus precursor pulse times) [10]. The required ALD conditions and experimental data points are obtained from our previous study (Figure 2 in the reference) [10]. Some interaction parameters were already calculated, i.e., the binary interaction parameters between Si, Ti, N, and CH 3 groups (Table 1 in the reference) [3].…”

Section: Introductionmentioning

confidence: 99%

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Quantification of Water Impurity in an Atomic Layer Deposition Reactor Using Group Contribution Method

Takoudis

2021

RDMS

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Atomic Layer Deposition (ALD) is a vapor phase process to deposit thin films using precursors and co-reactants on a variety of substrates. The ALD system, the data of which is used here, had aimed to deposit TiO2 thin films on polymethyl methacrylate (PMMA) and silicon reference substrates using tetrakis(dimethylamido)titanium and ozone. Absorbed water molecules in PMMA were released into the reactor during deposition, acted as a co-reactant, and affected the growth rate on the silicon reference substrate. The objective of this work is to theoretically calculate the amount of water impurities in the ALD reactor during several number of cycles. A group contribution method based on Adsorbate Solid Solution Theory (ASST) is employed to theoretically estimate the number of moles of water in the abovementioned ALD reactor.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Quantification of Water Impurity in an Atomic Layer Deposition Reactor Using Group Contribution Method

Takoudis

2021

RDMS

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“…The coated PMMA reduced the water contact angle from 84° to almost 20°, which means a remarkable hydrophilicity improvement. The hardness of the sample with 30 nm TiO 2 was tested by Vickers’ hardness method, applying a 300 g-force; the results were improved by almost 60% [ 55 ].…”

Section: Coatings On Pmma By Thermal Atomic Layer Depositionmentioning

confidence: 99%

Is Poly(methyl methacrylate) (PMMA) a Suitable Substrate for ALD?: A Review

et al. 2021

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Poly (methyl methacrylate) (PMMA) is a thermoplastic synthetic polymer, which displays superior characteristics such as transparency, good tensile strength, and processability. Its performance can be improved by surface engineering via the use of functionalized thin film coatings, resulting in its versatility across a host of applications including, energy harvesting, dielectric layers and water purification. Modification of the PMMA surface can be achieved by atomic layer deposition (ALD), a vapor-phase, chemical deposition technique, which permits atomic-level control. However, PMMA presents a challenge for ALD due to its lack of active surface sites, necessary for gas precursor reaction, nucleation, and subsequent growth. The purpose of this review is to discuss the research related to the employment of PMMA as either a substrate, support, or masking layer over a range of ALD thin film growth techniques, namely, thermal, plasma-enhanced, and area-selective atomic layer deposition. It also highlights applications in the selected fields of flexible electronics, biomaterials, sensing, and photocatalysis, and underscores relevant characterization techniques. Further, it concludes with a prospective view of the role of ALD in PMMA processing.

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New Phenothiazine Derivatives That Exhibit Photoinduced Room‐Temperature Phosphorescence

Wang

Yang

Fang

et al. 2021

Adv Funct Materials

113

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The research of purely organic room‐temperature phosphorescence (RTP) materials with stimulus response characteristic has drawn increasing attention for their broad application prospects. However, these kinds of materials are really scarce now, especially for those with efficient RTP emissions, which have largely limited their practical applications. Here, an all‐around‐type player in the field of photoinduced phosphorescence material appears, whose RTP efficiency can increase from near 0 to 22% after continuous UV irradiation. Correspondingly, the UV‐written patterns based on them can be clearly observed by the naked eye in daytime or even under sunlight. Moreover, these materials are found to show excellent photostability, and the strong RTP emission can still be observed after repeated activation for more than 50 times. The high RTP efficiency and good photostability make these photoinduced RTP materials exhibit an attractive prospect for potential applications in many fields, including leak test, microcrack detection, programmable information storage, and encryption.

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Enhancing the surface properties and functionalization of polymethyl methacrylate with atomic layer-deposited titanium(IV) oxide

Cited by 23 publications

References 72 publications

Quantification of Water Impurity in an Atomic Layer Deposition Reactor Using Group Contribution Method

Quantification of Water Impurity in an Atomic Layer Deposition Reactor Using Group Contribution Method

Is Poly(methyl methacrylate) (PMMA) a Suitable Substrate for ALD?: A Review

New Phenothiazine Derivatives That Exhibit Photoinduced Room‐Temperature Phosphorescence

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