2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC) 2015
DOI: 10.1109/pvsc.2015.7356082
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Epitaxial and non-epitaxial large area GaSb-based thermophotovoltaic (TPV) cells

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Cited by 3 publications
(3 citation statements)
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“…This causes a non-uniform p-n junction formation due to different thicknesses of the active region. Rahimi et al [ 59 ] demonstrated that the Be-implanted GaSb exhibits similar performance to the MBE-grown GaSb TPV cell. To achieve this, the implanted dopants on the semiconductor substrate must undergo a rapid thermal annealing (RTA) process where the cell is exposed to a high temperature to remove the implant-induced damage and therefore achieving a higher shunt resistance [ 55 , 60 ].…”
Section: Tpv Cell Fabricationmentioning
confidence: 99%
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“…This causes a non-uniform p-n junction formation due to different thicknesses of the active region. Rahimi et al [ 59 ] demonstrated that the Be-implanted GaSb exhibits similar performance to the MBE-grown GaSb TPV cell. To achieve this, the implanted dopants on the semiconductor substrate must undergo a rapid thermal annealing (RTA) process where the cell is exposed to a high temperature to remove the implant-induced damage and therefore achieving a higher shunt resistance [ 55 , 60 ].…”
Section: Tpv Cell Fabricationmentioning
confidence: 99%
“…However, a GaSb structure grown over a large area is challenging due to the difficulty of finding an epi-ready substrate, non-uniform native oxide desorption, and shunt defect formation. A key advantage of using the MBE method to grow TPV cell is the generation of a higher when compared to the MOVPE and LPE methods [ 59 , 80 ]. Table 1 provides a summary of characteristics, advantages and disadvantages for different types of TPV cell growth methods.…”
Section: Tpv Cell Fabricationmentioning
confidence: 99%
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