2014
DOI: 10.1134/s0020168514070097
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Etching behavior of PbTe and Pb1 − x Sn x Te crystal surfaces in aqueous H2O2-HBr-tartaric acid solutions

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Cited by 6 publications
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“…Also, the bromides formed during oxidation of the crystal surface layers promote transition of dissolution process into the diffusion region. In these bromine-emerging etchants, the kinetics of chemical dissolution of PbTe [15][16][17][18][19][20][21][22][23][24][25]. The peculiaritues of chemical-dynamic polishing of PbTe and Pb 1-x Sn x Te crystals in Н 2 О 2 -НBr (44 %) etchant compositions were studied, and it was ascertained that the increase of Sn content in the Pb 1-x Sn x Te solid solutions leads to a slight increase of the etching rate, but the regions of polishing solutions were without changes [15].…”
Section: Etchants Based On Bromine Compounds (Bromine-containing Etchmentioning
confidence: 99%
“…Also, the bromides formed during oxidation of the crystal surface layers promote transition of dissolution process into the diffusion region. In these bromine-emerging etchants, the kinetics of chemical dissolution of PbTe [15][16][17][18][19][20][21][22][23][24][25]. The peculiaritues of chemical-dynamic polishing of PbTe and Pb 1-x Sn x Te crystals in Н 2 О 2 -НBr (44 %) etchant compositions were studied, and it was ascertained that the increase of Sn content in the Pb 1-x Sn x Te solid solutions leads to a slight increase of the etching rate, but the regions of polishing solutions were without changes [15].…”
Section: Etchants Based On Bromine Compounds (Bromine-containing Etchmentioning
confidence: 99%