2006
DOI: 10.1117/12.694884
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Evaluation of cleaning methods for multilayer diffraction gratings

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Cited by 14 publications
(14 citation statements)
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“…Ashe [5] had described that the Piranha solution which is a mixture of a strong acid and a strong oxidizing agent was used to remove the residues on the surface of gratings at high temperature. [6] 5th International Symposium on Advanced Optical Manufacturing and The result shows that the high LIDT was greater than 2.7 J/cm 2 at 1053nm with 10-ps pulse length (for both 1-on-1 and N-on-1). The similar cleaning method which can also reaches the LIDT specification had been reported by Britten .…”
Section: Introductionmentioning
confidence: 93%
“…Ashe [5] had described that the Piranha solution which is a mixture of a strong acid and a strong oxidizing agent was used to remove the residues on the surface of gratings at high temperature. [6] 5th International Symposium on Advanced Optical Manufacturing and The result shows that the high LIDT was greater than 2.7 J/cm 2 at 1053nm with 10-ps pulse length (for both 1-on-1 and N-on-1). The similar cleaning method which can also reaches the LIDT specification had been reported by Britten .…”
Section: Introductionmentioning
confidence: 93%
“…Ashe et al [11,12] were among the first to publish on this topic. They compared a number of chemical wet-cleaning methods commonly used in the semiconductor industry.…”
Section: Mld Grating Cleaningmentioning
confidence: 99%
“…Britten and Nguyen [15] developed a cleaning method for diffraction gratings that involved stripping bulk photoresist with an aqueous base and employing an oxidizing acid solution to remove residues, with oxygen plasma used as an intermediate step to remove fluorinated hydrocarbon residues. Plasma cleaning with oxygen and other gases has been suggested as a method for removing bulk organic layers of BARC [11,16] and photoresist [17,18] from gratings.…”
Section: Mld Grating Cleaningmentioning
confidence: 99%
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