Evaluation of PAC performance in a thick film photoresist

Abstract

In this paper we evaluate the photoactive compound (PAC) performance in a thick film photoresist. In an effort to report the performance of a thick film photoresist and the correlation to PAC structure, we have studied several formulations containing a monofunctional PAC(A) in comparison to a polyfunctional PAC(B). We have seen that the use of a monoftmctional photoactive compound provides for a high performance thick film photoresist with good profile, depth of focus, resolution, and exposure latitude. A polyfunctional PAC however, causes a loss in performance. The ratio of monofunctional PAC(A) to polyfunctional PAC(B) was varied and lithography was studied on a Nikon® stepper (i-line). In our study, we evaluate the effect ofthe addition of PAC(B) to our formulations and the consequences in terms oflithographic performance.