Experimental validation and molecular dynamics simulation of removal of PO residue on Co surface by alkaline cleaning solution with different functional groups

Sun, Xiaoqin; Zhang, Shihao; Liu, Mengrui; Tan, Baimei; He, Yangang; Yin, Da; Gao, Pengcheng; Wang, Yazhen

doi:10.1016/j.colsurfa.2020.125932

Cited by 28 publications

(14 citation statements)

References 44 publications

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“…The minimum contact angle was 51 °with EDTA reaching 0.15 wt%, which is close to that of clean Co surface. 27 It showed that the optimum effect of cleaning the Co(II)-NA complex on Co surface could be obtained under this concentration. The ions.…”

Section: Resultsmentioning

confidence: 89%

“…43 However, the i corr of fresh cobalt sample was 2.154 μA cm −2 . 27 The i corr was one order of magnitude lower than that of fresh Co samples, indicating that residues on Co surface had not been completely removed after cleaning. The i corr of the Co surface cleaned by different concentrations of TMAH increased significantly.…”

Section: Resultsmentioning

confidence: 90%

“…26 Gly is widely applied in the complexation of metal ions in alkaline CMP polishing solution. 5 Sun et al 27 researched the effect on removing Potassium oleate (PO) from Co surface by TETA, EDTA and Gly. The molecular activities of the three complexing agents were studied, and their action mechanism and complexing effects were compared.…”

mentioning

confidence: 99%

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Unraveling the Mechanism of Removing NA Contamination by TMAH-Based Cleaning Solution During Post Co-CMP Cleaning

Cui¹,

Ma²,

Tan³

et al. 2022

ECS J. Solid State Sci. Technol.

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Nicotinic acid (NA) has been widely applied to inhibit corrosion on the Co surface in the Co interconnection chemical mechanical polishing (CMP). The insoluble Co(II)-NA complexes can be observed as organic residues on Co surface after CMP. In this work, the effects of different cleaning solution combination between TMAH and three complexing agents (TETA, EDTA and Gly) on removing NA contamination on the Co surface were researched. Electrochemistry, contact angle, X-ray photoelectron spectroscopy and atomic force microscope were applied to explore the cleaning effect and mechanism. The results showed that the synergetic action of 0.15 wt.% EDTA and 0.15 wt.% TMAH had the optimal removal effect and could significantly remove NA contamination on Co surface. In addition, the molecular activity of NA was calculated based on Density functional theory (DFT) to clarify the mechanism of cleaning process. The results showed that the bond between NA and Co2+ was broken and the Co(II)-NA complex film was decomposed under the action of the cleaning solution.

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Section: Resultsmentioning

confidence: 89%

Section: Resultsmentioning

confidence: 90%

See 1 more Smart Citation

Unraveling the Mechanism of Removing NA Contamination by TMAH-Based Cleaning Solution During Post Co-CMP Cleaning

Cui¹,

Ma²,

Tan³

et al. 2022

ECS J. Solid State Sci. Technol.

Self Cite

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“…Similarly, the LUMO is associated with the innermost orbital that contains vacancies and signifies the capacity to accept electrons. 27,32,[42][43][44] Figure 9 shows the optimized molecular structural formulas of CAO, LAPAO, JFCE, OA12, DTAC, and TX100. The spatial distribution of the optimized molecular, HOMO and LUMO energy levels of the six surfactants and DIW are shown in Fig.…”

Section: Resultsmentioning

confidence: 99%

“…The summing approach is based on Ewald's electrostatic force and atoms' van der Waals forces. 21,[25][26][27][28][29] Quench simulations were performed for the whole system to obtain the lowest energy configuration, and finally the total energy of the complex system was calculated.…”

Section: Methodsmentioning

confidence: 99%

The Effect of Surfactants on the Removal of Ceria Particles in the Buff Clean Process

Wang

Sun

et al. 2023

ECS J. Solid State Sci. Technol.

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We have established a new buff clean method using deionized water (DIW) with 2000 ppm surfactants to remove ceria particles from the surface of SiO2 after chemical mechanical polishing. Six kinds of surfactants have been compared. The scanning electron microscopy and atomic force microscopy results show that with CAO and LAPAO, the ceria particles can be fully removed in the buff clean process. The molecular activity and adsorption energy of surfactants are calculated based on the density functional theory to clarify the mechanism of the buff clean process. The surfactants adsorbing on the SiO2 surface can be fully removed after the buff clean process.

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Synergistic effect of new imidazoline derivative and 2‐aminopyridine as corrosion inhibitors for Q235: Experimental and theoretical study

Wang,

Fan,

Song

et al. 2024

Surface & Interface Analysis

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In order to reduce the investment of corrosion inhibitors, based on experimental and theoretical studies, the corrosion inhibition and mechanism of new imidazoline derivatives (SMIS) and 2‐aminopyridine (AMP) were investigated carefully. The best corrosion inhibition effect was at 0.7‐g/L SMIS and 0.3‐g/L AMP, the corrosion inhibition efficiency of weight loss, electrochemical impedance spectroscopy, and potentiodynamic polarization (Tafel) were 90.54%, 98.56% and 97.68%, respectively. Electrochemical research shows that SMIS&AMP belongs to cathodic corrosion inhibition. SMIS&AMP mainly increased the film resistance and charge transfer resistance in 1‐M HCl, thus playing a certain role in corrosion inhibition. X‐ray photoelectron spectroscopy and energy dispersive spectrometer proved that SMIS&AMP can be adsorbed on the surface of Q235, molecular dynamics showed that there was a certain synergy between SMIS and AMP. This study confirmed that SMIS and AMP have a good synergistic effect, improve the corrosion inhibition efficiency, reduce the synthesis cost of SMIS, and have a certain guiding significance for synergistic corrosion inhibition.

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Experimental validation and molecular dynamics simulation of removal of PO residue on Co surface by alkaline cleaning solution with different functional groups

Cited by 28 publications

References 44 publications

Unraveling the Mechanism of Removing NA Contamination by TMAH-Based Cleaning Solution During Post Co-CMP Cleaning

Unraveling the Mechanism of Removing NA Contamination by TMAH-Based Cleaning Solution During Post Co-CMP Cleaning

The Effect of Surfactants on the Removal of Ceria Particles in the Buff Clean Process

Synergistic effect of new imidazoline derivative and 2‐aminopyridine as corrosion inhibitors for Q235: Experimental and theoretical study

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