Exploring high-NA EUV mask specification for logic metal

Miyaguchi, Kenichi; Hwang, Soobin; Oak, Apoorva; Kim, Ryoung-han

doi:10.1117/12.3035717

Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology 2024

DOI: 10.1117/12.3035717

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Exploring high-NA EUV mask specification for logic metal

Kenichi Miyaguchi,

Soobin Hwang,

Apoorva Oak

et al.

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Exploring high-NA EUV mask specification for logic metal

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References 4 publications

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