fabrication of diamond membranes for MEMS using reactive ion etching of silicon

Ramesham, R.; Ellis, Charles D.; Olivas, J.D.; Bolin, S.

doi:10.1016/s0040-6090(98)00825-6

Cited by 12 publications

(3 citation statements)

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“…Moreover, silicon and glass are interesting substrates as they enable thin diamond membrane synthesis via etching techniques. [37,[127][128][129] In addition, substrates like silicon, molybdenum, and titanium react with the carbon from the gas phase to form carbides, which accounts for the strong adhesion of diamond coatings to these materials. In contrast, it is challenging to coat diamond films on copper because copper does not form carbides, resulting in a low interface strength and resulting in the delamination of the diamond coating.…”

Section: Effect Of Substrate Materialsmentioning

confidence: 99%

Ultrathin Diamond Nanofilms—Development, Challenges, and Applications

Handschuh‐Wang

Wang

Tang

2021

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Diamond is a highly attractive material for ample applications in material science, engineering, chemistry, and biology because of its favorable properties. The advent of conductive diamond coatings and the steady demand for miniaturization in a plethora of economic and scientific fields resulted in the impetus for interdisciplinary research to develop intricate deposition techniques for thin (≤1000 nm) and ultra‐thin (≤100 nm) diamond films on non‐diamond substrates. By virtue of the lowered thickness, diamond coatings feature high optical transparency in UV–IR range. Combined with their semi‐conductivity and mechanical robustness, they are promising candidates for solar cells, optical devices, transparent electrodes, and photochemical applications. In this review, the difficulty of (ultra‐thin) diamond film development and production, introduction of important stepping stones for thin diamond synthesis, and summarization of the main nucleation procedures for diamond film synthesis are elucidated. Thereafter, applications of thin diamond coatings are highlighted with a focus on applications relying on ultrathin diamond coatings, and the excellent properties of the diamond exploited in said applications are discussed, thus guiding the reader and enabling the reader to quickly get acquainted with the research field of ultrathin diamond coatings.

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Section: Effect Of Substrate Materialsmentioning

confidence: 99%

Ultrathin Diamond Nanofilms—Development, Challenges, and Applications

Handschuh‐Wang

Wang

Tang

2021

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“…Different selective deposition methods have been proposed, for example, the selectively damaging the substrate, application ofphotoresist mixed with diamond powders [4], pre-patterning of substrate with an interlayer [5,6], etc. Plasma etching of diamond structure with reactive ions, for example, SF4, 02, Ar has also been applied [8], but the problem is the low etching-selectivity between the mask material and diamond films, as well as the poor quality of the fabricated structure. The site-selective deposition of micro-patterned diamond films is particularly significant because there is no need for an additional process to fabricate the micropatterned structure [7].…”

Section: Infroductionmentioning

confidence: 99%

<title>Patterning of diamond microstructures on Si substrate by bulk and surface micromachining</title>

Miao

et al. 2000

SPIE Proceedings

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ABSTARCT Diamond microstructures were patterned over silicon/silicon dioxide substrate using the processes combined with bulk or surface micromachining, selective growth of diamond and plasma etching technique.Polycrystalline diamond films were prepared using microwave plasma enhanced chemical vapor deposition (MW-PECVD) and a gas mixture ofhydrogen and methane. (1 11)-and (100)-orientated diamond films were synthesized and smooth (100)-textured thin films were successfully deposited on silicon structures, such as trenches, corners, edges, forming a good heat-diffusing and insulating layer as well as a protective wearresistant surface. Two types of techniques for precise patterning of diamond microstructures were investigated in this paper. The first one was to selectively grow diamond films in the desired region by predepositing a Pt interlayer on silicon dioxide layer. The second one was to selectively etch the deposited diamond film by oxygen/argon plasma under an Al mask. Different microstructures, for example, diamond membrane, microgear, microrotor, comb drive structure, etc. were successfully fabricated.

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“…[1][2][3][4][5][6][7] In the work described here, we fabricated diamond microstructures ͑the basic building blocks of MEMS͒ using silicon molds in which diamond is formed by microwave plasma assisted chemical vapor deposition ͑CVD͒, and the fidelity of the diamond replicas was evaluated quantitatively. This is due to the silicon microcircuitry fabrication technology that has been honed over the decades to an impressively high pitch.…”

Section: Introductionmentioning

confidence: 99%