Fabrication tolerant multi-layer integrated photonic topology optimization

Abstract

Optimal multi-layer device design requires consideration of fabrication uncertainties associated with inter-layer alignment and conformal layering. We present layer-restricted topology optimization (TO), which we believe to be a novel technique which mitigates the effects of unwanted conformal layering for multi-layer structures and enables TO in multi-etch material platforms. We explore several approaches to achieve this result compatible with density-based TO projection techniques and geometric constraints. Then, we present a robust TO formulation to design devices resilient to inter-layer misalignment. The novel constraint and robust formulation are demonstrated in 2D grating couplers and a 3D polarization rotator.