2013
DOI: 10.1002/cvde.201307088
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Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UVC Light

Abstract: A facile and fast CVD method for the deposition of TiO 2 films, under atmospheric pressure and at room temperature, onto glass and polyethylene terephthalate (PET) substrates is explored. The hydrolysis reaction of titanium tetraisopropoxide (TTIP) is employed for the deposition of TiO 2 film, and the corresponding deposition rate determined. The surface morphology of the as-deposited TiO 2 films is observed by scanning electron microscopy (SEM) and atomic force microscopy (AFM). In order to confirm the struct… Show more

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Cited by 24 publications
(18 citation statements)
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“…The possibility to grow TiO 2 thin films at temperatures sufficiently low to avoid the PS thermal degradation is widely reported in literature . Consequently, the TiO 2 deposition is initially carried out at 50 °C to avoid any thermal damage to the organic scaffold.…”
Section: Resultssupporting
confidence: 53%
See 1 more Smart Citation
“…The possibility to grow TiO 2 thin films at temperatures sufficiently low to avoid the PS thermal degradation is widely reported in literature . Consequently, the TiO 2 deposition is initially carried out at 50 °C to avoid any thermal damage to the organic scaffold.…”
Section: Resultssupporting
confidence: 53%
“…Liang et al deposited alumina and titania films on porous poly(styrene‐divinylbenzene) particles; Mitchell et al obtained titania thin films at a temperature suitable to polymeric substrate (80 °C); and, in the aforementioned work of Wang, ALD method was used to obtain nanostructured TiO 2 nanobowls . Sun et al deposited amorphous TiO 2 film on a moving substrate under atmospheric pressure and at room temperature …”
Section: Introductionmentioning
confidence: 99%
“…This is in agreement with the results of XPS. Considering AmT support contains a large number of surface OH groups, hydrogen bonds would be formed between the OH groups and NH 3 during the preparation of (Au/AmT) NA , thus leading to the generation of [NH 3 ] s . In this study, the presence of [NH 3 ] s greatly suppresses the reduction of Au precursors on AmT support (as evidenced by the XPS results), which is responsible for the poor photocatalytic activity of (Au/AmT) NA .…”
Section: Resultsmentioning
confidence: 99%
“…Currently, rutile and anatase mixed crystal TiO 2 (such as commercial P25) is commonly used in the preparation of photocatalysts, but amorphous TiO 2 (AmT) as support for Au/TiO 2 has not been reported. More recently, we reported that an AmT with abundant hydroxyl groups and large surface area, favors the rapid transfer of electrons and thus greatly restrains charge carrier recombination . Using AmT to prepare Au/TiO 2 photocatalyst through MI method would possess the following benefits.…”
Section: Introductionmentioning
confidence: 99%
“…After plasma irradiation, samples (i) c –(vii) c were coated with amorphous TiO 2 film for 15 min via chemical vapor deposition using titanium (IV) isopropoxide (TTIP) and H 2 O as the precursors, using a method described previously, then calcined in air atmosphere at 500 °C for 2 h to convert amorphous TiO 2 into the anatase phase.…”
Section: Methodsmentioning
confidence: 99%