Metrology, Inspection, and Process Control XXXVIII 2024
DOI: 10.1117/12.3010421
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Feature grouping to enable edge placement error-aware process control in multi-feature logic use case

Guillaume Schelcher,
Marsil Athayde,
Stijn Schoofs
et al.

Abstract: The grouping method assisted EPE-aware control method is being explored in a multi-feature dual layer Logic use case. EPE metric is estimated using angle resolved optical Scatterometry based overlay and electron beam-based metrology (large field of view SEM) for the reconstruction of edge-to-edge distance between the Metal and Via pattern. In the setup phase, EPE sensitivities to dose and focus have been derived using data from a FEM wafer. EPE-aware optimization, using scanner dose and overlay control sub-rec… Show more

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