Abstract:One of the most obvious trends i n microelectronics is the rapid decrease of the device sizes. In some technological areas, such as the new sub-100 nm electron beam lithography techniques [l] or the conshuction of miniaturized x-ray tubes [2, 31, there is a strong demand of intensive, narrow energy spectrum and miniaturized electron sources. It is already known that the field emission (FE) cathodes can be used as efficient sub-micrometer electron sources. In particular, sharp silicon tips which can be easily … Show more
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