Flow behavior control in immersion lithography

Fu, Xin; Huang, Yao; Hu, Liang; Xie, Haibo; Chen, Wenyu

doi:10.1016/j.flowmeasinst.2016.07.008

Cited by 18 publications

(4 citation statements)

References 75 publications

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“…Micro and nanoparticles play an important role in a large variety of fields including aerospace industry [1], drug delivery [2] and contamination control in high-tech mechanical systems [3,4]. Such particles are produced and suspended in fluids during machine operations, components handling, material processing, and by unintentional and/or undesirable release into the working environment.…”

Section: Introductionmentioning

confidence: 99%

Drag and lift coefficients of ellipsoidal particles under rarefied flow conditions

et al. 2022

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Section: Introductionmentioning

confidence: 99%

Drag and lift coefficients of ellipsoidal particles under rarefied flow conditions

et al. 2022

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“…In Immersion lithography, the immersion liquid plays a crucial role on the pattern transfer from the projection lens to the silicon wafer [1][2][3]. In order to acquire the premium quality of the image after exposure, the immersion liquid must remain highly pure and flow stably [4][5][6]. In this paper, a mathematical model is constructed for the immersion fluid field via the use of theoretical analysis.…”

Section: Introductionmentioning

confidence: 99%

Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Zheng¹,

Chen²

2019

dtcse

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The immersion liquid plays a crucial role on the pattern transfer from the projecting lens to the silicon wafer in immersion lithography. To acquire the premium quality of the image after exposure, the immersion liquid must remain highly pure and flow stably. In this paper, a mathematical model is constructed for the immersion fluid field and effects of various structural parameters on the flowing of the immersion liquid are investigated. As a result, optimal structural parameters of the immersion field are acquired to ensure the fast and stable flowing of the immersion liquid in the end.

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“…However, the stability may be destroyed under external forces. For example, in immersion lithography, the liquid confined between the lens and wafer will be deformed or even ruptured into drops under strong shear stress due to the high-speed scanning motion of the wafer. , Once the liquid drops break through the confinement of the lens–wafer gap, they will be left on the wafer and cause exposure defects, which should be avoided in practical productions. Therefore, it is vital to find a method to transport the detached drops back to the bulk liquid without overstepping the working area, that is, directional drop transport is desired to prevent the leakage of the liquid confined in a parallel gap from bringing damages to the normal operation of the system.…”

Section: Introductionmentioning

confidence: 99%

Directional Transport of a Liquid Drop between Parallel–Nonparallel Combinative Plates

Huang

Chen

et al. 2018

Langmuir

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Liquids confined between two parallel plates can perform the function of transmission, support, or lubrication in many practical applications, due to which to maintain liquids stable within their working area is very important. However, instabilities may lead to the formation of leaking drops outside the bulk liquid, thus it is necessary to transport the detached drops back without overstepping the working area and causing destructive leakage to the system. In this study, we report a novel and facile method to solve this problem by introducing the wedgelike geometry into the parallel gap to form a parallel-nonparallel combinative construction. Transport performances of this structure were investigated. The criterion for self-propelled motion was established, which seemed more difficult to meet than that in the nonparallel gap. Then, we performed a more detailed investigation into the drop dynamics under squeezing and relaxing modes because the drops can surely return in hydrophilic combinative gaps, whereas uncertainties arose in gaps with a weak hydrophobic character. Therefore, through exploration of the transition mechanism of the drop motion state, a crucial factor named turning point was discovered and supposed to be directly related to the final state of the drops. On the basis of the theoretical model of turning point, the criterion to identify whether a liquid drop returns to the parallel part under squeezing and relaxing modes was achieved. These criteria can provide guidance on parameter selection and structural optimization for the combinative gap, so that the destructive leakage in practical productions can be avoided.

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Flow behavior control in immersion lithography

Cited by 18 publications

References 75 publications

Drag and lift coefficients of ellipsoidal particles under rarefied flow conditions

Drag and lift coefficients of ellipsoidal particles under rarefied flow conditions

Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Directional Transport of a Liquid Drop between Parallel–Nonparallel Combinative Plates

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