Focusing high-energy heavy ion microbeam system at the JAEA AVF cyclotron

Transient current mapping obtained from silicon photodiodes using focused ion microbeams with several hundreds of MeV

“…The microbeam spot size is evaluated from an image of the ion induced secondary electrons (Secondary Electron Mapping; SEM) from the #1000 Cu mesh [6]. The vertical and the horizontal sizes of the beam spot of 260 MeV-Ne are 1.6 and 1.2 lm and those of 520 MeV-Ar are 1.2 and 0.9 lm, respectively [9].…”

“…Recently the focusing microbeam from the AVF Cyclotron at JAEA has been successfully developed [6]. Its energy reaches several hundred MeV and the smallest beam size of less than 1 lm has beam measured.…”

Irradiation Facilities of the Takasaki Advanced Radiation Research Institute

“…To form a microbeam with a spot size of about 1 µm with fewer scattered ions, a microbeam formation system using focusing magnets is installed in another vertical beamline (HX beamline) [16]. The system consists of quadruplet quadrupole magnets, microslits, divergence angle defining slits, and so on.…”

The Role of Ion Track Structure on High-Injection Carrier Dynamics in High-Speed Si and III-V Optoelectronic Sensors

“…The first microbeam used was routinely used high-energy heavy ion microbeam described elsewhere [31]. The second system is the newly completed ultra high-energy microbeam based on focusing the output beam from an AVF cyclotron [35]. Ions used on the tandem accelerator were 15 MeV O, 13 MeV N and 11 MeV C. A 260 MeV beam was used on the new cyclotron.…”