2008
DOI: 10.1063/1.2955448
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Formation and diffusion of oxygen-vacancy pairs on TiO2(110)-(1×1)

Abstract: We present the measurements for the diffusion of bridging oxygen vacancy (OV) crossover Ti rows via OV pairs (OVPs). Using a high-resolution scanning tunneling microscope (STM), we show that the OVs can be moved along the bridging oxygen rows driven by the STM tip at voltages higher than 3.0 V on TiO(2)(110)-(1x1) surface. It is found that the combination of OVPs leads to the formation of OVPs, which can diffuse crossover Ti rows under the mediation of OVs in adjacent bridging oxygen rows. The deduced diffusio… Show more

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Cited by 53 publications
(69 citation statements)
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“…The diffusion of these pairs of Obvac has also been reported. [89] The excitation mechanism of this reaction is not known; however, the application of a high bias voltage is necessary for the reaction to take place. This suggests that the electric field between the tip and the surface plays an important role in the reaction.…”
Section: Manipulation Of Defectsmentioning
confidence: 99%
“…The diffusion of these pairs of Obvac has also been reported. [89] The excitation mechanism of this reaction is not known; however, the application of a high bias voltage is necessary for the reaction to take place. This suggests that the electric field between the tip and the surface plays an important role in the reaction.…”
Section: Manipulation Of Defectsmentioning
confidence: 99%
“…[31][32][33] The STM experiment on the methanol/TiO 2 (110) surface was conducted with a low temperature scanning tunnelling microscope (Omicron, MATRIX) in an UHV system. In the STM experiment on methanol on TiO 2 (110), the vacuum system was baked for about 100 h and had a base pressure of 3 Â 10 À11 mbar.…”
Section: Scanning Tunnelling Microscopy Techniquementioning
confidence: 99%
“…al. 29 , and therefore necessitates a reinterpretation of the formate adsorption structure on TiO 2 (110), and the role of O vacancies for the surface reactivity of TiO 2 in general. 14,15 …”
Section: Introductionmentioning
confidence: 99%