2012
DOI: 10.1021/jp3053423
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Formation of Surface Relief Gratings: Effect of the Density of the Host Material

Abstract: We use molecular dynamics simulations to investigate the effect of the density of the host material on the isomerization-induced diffusion mechanism that results in surface relief gratings formation. We find that a decrease in density increases the diffusion coefficient in a similar way for driven and spontaneous diffusion. This result suggests that the driving mechanism depends only slightly on the density of the host material. The pressure variations during the isomerization process decrease when the drive… Show more

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Cited by 6 publications
(9 citation statements)
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“…We simulate the photoisomerization of one dispersed red (DR1) molecule (C 16 works [8,[13][14][15]. The main differences are that: i) The concentration of probe molecules is here much smaller and the size of the box larger.…”
Section: Calculationsmentioning
confidence: 99%
See 1 more Smart Citation
“…We simulate the photoisomerization of one dispersed red (DR1) molecule (C 16 works [8,[13][14][15]. The main differences are that: i) The concentration of probe molecules is here much smaller and the size of the box larger.…”
Section: Calculationsmentioning
confidence: 99%
“…works [8,[13][14][15]. The main differences are that: i) The concentration of probe molecules is here much smaller and the size of the box larger.…”
Section: Calculationsmentioning
confidence: 99%
“…Dynamic simulation models implementing cyclic trans-cis-trans photoisomerization of azobenzene have been developed for coarse-grained [79,80] and fully atomistic simulation studies [43][44][45][46]81] as well as combinations of such approaches [82]. As a starting point, the present investigation adapts the so-called cyclic photoisomerization model (CPM) in close agreement with the protocol of Ref.…”
Section: Modeling the Collective Photoisomerization Kinetics: The Cyclic Photoisomerization Modelmentioning
confidence: 80%
“…3. 12,37,38 from molecular dynamics simulations in several papers. Then below 200 K the exponential evolution slows down tending to a constant low temperature limit hSi E 1.5 mm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…From room temperature to T E 200 K the mean surface of the aligned pattern zones follows an exponential evolution with temperature (green dashed line). 12,37,38 When the material is not illuminated the diffusion coefficient D follows a similar Arrhenius law to the inverse of the viscosity Z as these two quantities are related to the Stokes-Einstein law: D = k B T/6pZa. This evolution upon exposure to light is reminiscent of the diffusion coefficient evolution with temperature when the material is illuminated reported = 73 K, right).…”
Section: Resultsmentioning
confidence: 99%