2020
DOI: 10.1002/ange.202012218
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Frustrated Lewis Pair Chelation as a Vehicle for Low‐Temperature Semiconductor Element and Polymer Deposition

Abstract: The stabilization of silicon(II) and germanium(II) dihydrides by an intramolecular Frustrated Lewis Pair (FLP) ligand, PB, i Pr 2 P(C 6 H 4)BCy 2 (Cy = cyclohexyl) is reported. The resulting hydride complexes [PB{SiH 2 }] and [PB{GeH 2 }] are indefinitely stable at room temperature, yet can deposit films of silicon and germanium, respectively, upon mild thermolysis in solution. Hallmarks of this work include: 1) the ability to recycle the FLP phosphine-borane ligand (PB) after element deposition, and 2) the si… Show more

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Cited by 10 publications
(4 citation statements)
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“…S64, † the 1 : 1 : 1 reaction of benzyl azide, phenylacetylene, and cat. 3 in an NMR tube clearly showed the progression of the reaction toward the anticipated cyclization reaction to give the triazole 5), and C6-C7 1.456 (6).…”
Section: Dalton Transactions Papermentioning
confidence: 98%
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“…S64, † the 1 : 1 : 1 reaction of benzyl azide, phenylacetylene, and cat. 3 in an NMR tube clearly showed the progression of the reaction toward the anticipated cyclization reaction to give the triazole 5), and C6-C7 1.456 (6).…”
Section: Dalton Transactions Papermentioning
confidence: 98%
“…As shown in Chart 1, group 13 and 14 element substituted phosphines of types I and II were isolated and used in both main group and transition metal chemistry. Among these two classes of phosphines, type I was introduced recently; 6–8 however, species of type II (R = Me, Cl, H) were isolated several years ago. 9–11 Type II phosphines consisting of ortho -silylated groups and their transition metal complexes have been shown to exhibit enhanced solubility in various non-polar solvents which is in contrast to many typical aryl phosphine ligands.…”
Section: Introductionmentioning
confidence: 99%
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“…Also, Inoue reported on an alternative synthetic strategy resulting in the formation of III , which was obtained by the reaction of IMe 4 ⋅ SiHSi t Bu 3 (IMe 4 =1,3,4,5‐tetra(methyl)imidazol‐2‐ylidene) with H 3 N ⋅ BH 3 by dehydrogenation to H 2 NBH 2 and subsequent insertion/rearrangement processes [7] . Furthermore, two very recent examples of heterocycles that include group 13/14/15 element‐based building blocks are: IV , [8] reported by Kinjo, and the Frustrated Lewis Pair (FLP)‐stabilized adducts V , synthesized by the Rivard group; notably, compounds V can be used as precursors for the low‐temperature deposition (<100 °C) of elemental Si and Ge films from solution [9] . A rare example of a heterocycle that consists exclusively of combinations of group 13, group 14 (Tet≠C) and group 15 elements is VI , reported by Nöth; however, the characterization of VI was limited to NMR spectroscopy [10] .…”
Section: Introductionmentioning
confidence: 99%