FT-IR Study of Water Adsorption on Aluminum Oxide Surfaces

Al‐Abadleh, Hind A.; Grassian, Vicki H.

doi:10.1021/la026208a

Cited by 370 publications

(355 citation statements)

References 31 publications

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“…8 It shows a complex behavior where three distinct regimes can be observed. Below 10% relative humidity (RH), the formation of a hydroxide monolayer on the alumina was observed.…”

Section: B Low Temperature Aldmentioning

confidence: 99%

Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics

Poodt¹,

Knaapen²,

Illiberi³

et al. 2011

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Spatial atomic layer deposition can be used as a high-throughput manufacturing technique in functional thin film deposition for applications such as flexible electronics. This; however, requires low-temperature processing and handling of flexible substrates. The authors investigate the process conditions under which low-temperature spatial atomic layer deposition of alumina from trimethyl aluminum and water is possible. The water partial pressure is the critical parameter in this case. Finally, our approach to roll-to-roll spatial atomic layer deposition is discussed.

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“…8 It shows a complex behavior where three distinct regimes can be observed. Below 10% relative humidity (RH), the formation of a hydroxide monolayer on the alumina was observed.…”

Section: B Low Temperature Aldmentioning

confidence: 99%

Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics

Poodt¹,

Knaapen²,

Illiberi³

et al. 2011

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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show abstract

“…Moreover, the presence of physisorbed H 2 O on the Al 2 O 3 surface can also be of influence. 19,20 In addition, an unassigned broad feature around ϳ900 cm −1 is observed for the films deposited by plasma-assisted ALD. The feature is most-likely not related to the broad Al-O phonon mode ͑ϳ954 cm −1 in Ref.…”

mentioning

confidence: 94%

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

Langereis

Keijmel

Sanden

et al. 2008

Applied Physics Letters

125

134

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The surface groups created during plasma-assisted atomic layer deposition (ALD) of Al2O3 were studied by infrared spectroscopy. For temperatures in the range of 25–150°C, –CH3 and –OH were unveiled as dominant surface groups after the Al(CH3)3 precursor and O2 plasma half-cycles, respectively. At lower temperatures more –OH and C-related impurities were found to be incorporated in the Al2O3 film, but the impurity level could be reduced by prolonging the plasma exposure. The results demonstrate that –OH surface groups rule the surface chemistry of the Al2O3 process and likely that of plasma-assisted ALD of metal oxides from organometallic precursors in general.

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“…Also, we have investigated for the first time the effect of the simultaneous presence of water vapour on the kinetics by performing the experiments at elevated relative humidity. This latter experiment is motivated by previous studies that show that considerable amounts of water adsorb to alumina surfaces under atmospheric relative humidity conditions (Al-Abadleh and Grassian, 2003). We have used a static-mode, UV absorption apparatus for these studies because it can operate under high relative humidities whereas Knudsen cells, which have been used for recent studies of ozone/ mineral dust kinetics (Michel et al, 2002;Michel et al, 2003;Hanisch and Crowley, 2003), cannot.…”

Section: Introductionmentioning

confidence: 99%

Ozone decomposition kinetics on alumina: effects of ozone partial pressure, relative humidity and repeated oxidation cycles

2004

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Abstract. The room temperature kinetics of gas-phase ozone loss via heterogeneous interactions with thin alumina films has been studied in real-time using 254 nm absorption spectroscopy to monitor ozone concentrations. The films were prepared from dispersions of fine alumina powder in methanol and their surface areas were determined by an in situ procedure using adsorption of krypton at 77 K. The alumina was found to lose reactivity with increasing ozone exposure. However, some of the lost reactivity could be recovered over timescales of days in an environment free of water, ozone and carbon dioxide. From multiple exposures of ozone to the same film, it was found that the number of active sites is large, greater than 1.4×10 14 active sites per cm 2 of surface area or comparable to the total number of surface sites. The films maintain some reactivity at this point, which is consistent with there being some degree of active site regeneration during the experiment and with ozone loss being catalytic to some degree. The initial uptake coefficients on fresh films were found to be inversely dependent on the ozone concentration, varying from roughly 10 −6 for ozone concentrations of 10 14 molecules/cm 3 to 10 −5 at 10 13 molecules/cm 3 . The initial uptake coefficients were not dependent on the relative humidity, up to 75%, within the precision of the experiment. The reaction mechanism is discussed, as well as the implications these results have for assessing the effect of mineral dust on atmospheric oxidant levels.

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FT-IR Study of Water Adsorption on Aluminum Oxide Surfaces

Cited by 370 publications

References 31 publications

Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics

Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

Ozone decomposition kinetics on alumina: effects of ozone partial pressure, relative humidity and repeated oxidation cycles

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