Gas-Liquid Reactors With Volatile Liquid Reactants: Approximate Solution for Consecutive Bimolecular Reactions of General Order

Abstract

An approximate solution of the film model in presence of volatile liquid reactants is presented for the case of a general van de Vusse-like reaction scheme and general power-law reaction rates. The solution is obtained in a closed-form and simply requires the numerical solution of a system of nonlinear equations. The developed approximate solution is valid for any reaction regime and any number of reactions taking place within the liquid film. The application to a CSTR is discussed; this also serves as a test of the accuracy of the approximate solution carried out by comparison with the complete film model solved via the orthogonal collocation method. The numerical studies show that the approximate solution can be used with confidence for the usual encountered rate laws and that the volatility of the liquid reactants affects the performance of the CSTR mostly at the intermediate value of the Halla number.