2013
DOI: 10.1007/s00216-013-7114-8
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Generation of ion-bound solvent clusters as reactant ions in dopant-assisted APPI and APLI

Abstract: We provide experimental and theoretical evidence that the primary ionization process in the dopant-assisted varieties of the atmospheric pressure ionization methods atmospheric pressure photoionization and atmospheric pressure laser ionization in typical liquid chromatography-mass spectrometry settings is--as suggested in the literature--dopant radical cation formation. However, instead of direct dopant radical cation-analyte interaction--the broadly accepted subsequent step in the reaction cascade leading to … Show more

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Cited by 39 publications
(68 citation statements)
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“…As discussed earlier in literature [31,32], water and solvent clusters must thus take part in the ionization process. Water and methanol clusters have sufficiently low IEs [33,34] to be ionized by the 10.0 and 10.6 eV photons, and subsequent self-protonation can lead to generation of protonated solvent clusters.…”
Section: Ionization Of Model Compounds In Da-appimentioning
confidence: 82%
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“…As discussed earlier in literature [31,32], water and solvent clusters must thus take part in the ionization process. Water and methanol clusters have sufficiently low IEs [33,34] to be ionized by the 10.0 and 10.6 eV photons, and subsequent self-protonation can lead to generation of protonated solvent clusters.…”
Section: Ionization Of Model Compounds In Da-appimentioning
confidence: 82%
“…Water and methanol clusters have sufficiently low IEs [33,34] to be ionized by the 10.0 and 10.6 eV photons, and subsequent self-protonation can lead to generation of protonated solvent clusters. Alternatively, neutral solvent molecules can associate with dopant radical cations, and this also leads to generation of protonated solvent clusters [31]. The protonated solvent clusters can thereby protonate the analytes (Scheme 2, Reaction 4), possibly by ligand-switching as suggested by Klee et al [31].…”
Section: Ionization Of Model Compounds In Da-appimentioning
confidence: 98%
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