Gigatron® — a new source for low-pressure plasmas

Petasch, W.; Räuchle, E.; Weichart, J.; Bickmann, H.

doi:10.1016/0257-8972(95)08229-8

Cited by 19 publications

(4 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…For the treatment of PET films, a film carrier is used, which fixes the substrates at the position of the bottle wall. Microwave power is applied by means of a modified Plasmaline antenna,26, 27 which is mounted in the center of the symmetric reactor (Figure 1). The Plasmaline antenna feeds the process gases into the reactor chamber, where a pulsed plasma is ignited.…”

Section: Experimental Partmentioning

confidence: 99%

Silicon Oxide Permeation Barrier Coating and Plasma Sterilization of PET Bottles and Foils

Deilmann

Halfmann

Steves

et al. 2009

Plasma Processes & Polymers

View full text Add to dashboard Cite

The results of silicon oxide permeation barrier coating and plasma sterilization are shown using a low‐pressure microwave plasma reactor system based on a Plasmaline antenna developed for the treatment of polyethylene terephthalate bottles and foils. The influence of the coating composition on the barrier properties is analyzed and a good correlation is found. The optimized barrier coatings are analyzed regarding coating defects, which are visualized by means of capacitively coupled oxygen plasma etching of the coated substrates. The capabilities of plasma sterilization are exemplarily demonstrated for spores of Bacillus atrophaeus allowing for a spore reduction according to today's regulations for aseptic food packaging.

show abstract

Section: Experimental Partmentioning

confidence: 99%

Silicon Oxide Permeation Barrier Coating and Plasma Sterilization of PET Bottles and Foils

Deilmann

Halfmann

Steves

et al. 2009

Plasma Processes & Polymers

View full text Add to dashboard Cite

show abstract

“…For the treatment of PET films, a film carrier is used, which fixes the substrates at the position of the bottle wall. Microwave power is applied by means of a modified Plasmaline antenna [14,15], which is mounted on the centre of the symmetric reactor (figure 1). Additionally, the plasmaline antenna feeds the process gases into the reactor chamber, where a pulsed plasma is ignited.…”

Section: Plasma Reactormentioning

confidence: 99%

Permeation mechanisms of pulsed microwave plasma deposited silicon oxide films for food packaging applications

Deilmann¹,

Grabowski²,

Theiß³

et al. 2008

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

Silicon oxide barrier layers are deposited on polyethylene terephthalate as permeation barriers for food packaging applications by means of a low pressure microwave plasma. Hexamethyldisiloxane (HMDSO) and oxygen are used as process gases to deposit SiOx coatings via pulsed low pressure plasmas. The layer composition of the coating is investigated by Fourier transform infrared spectroscopy and energy dispersive x-ray spectroscopy to show correlations with barrier properties of the films. The oxygen permeation barrier is determined by the carrier gas method using an electrochemical detector. The transition from low to high barrier films is mapped by the transition from organic SiOxCyHz layers to quartz-like SiO1.7 films containing silanol bound hydrogen. A residual permeation as low as J = 1 ± 0.3 cm3 m−2 day−1 bar−1 is achieved, which is a good value for food packaging applications. Additionally, the activation energy Ep of oxygen permeation is analysed and a strong increase from Ep = 31.5 kJ mol−1 for SiOx CyHz-like coatings to Ep = 53.7 kJ mol−1 for SiO1.7 films is observed by increasing the oxygen dilution of HMDSO:O2 plasma. The reason for the residual permeation of high barrier films is discussed and coating defects are visualized by capacitively coupled atomic oxygen plasma etching of coated substrates. A defect density of 3000 mm−2 is revealed.

show abstract

“…The Duo-Plasmaline consists of a dielectric tube which is mounted transversely through a vacuum chamber [4][5][6]. The inside of the tube is under atmospheric pressure, outside is medium-vacuum.…”

Section: Medium-vacuum Rangementioning

confidence: 99%

Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

Schulz

Büchele

Ramisch

et al. 2012

Contrib. Plasma Phys.

View full text Add to dashboard Cite

There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1‐100 Pa) and medium pressure (103‐104 Pa) up to atmospheric pressure (105 Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

show abstract

Gigatron® — a new source for low-pressure plasmas

Cited by 19 publications

References 0 publications

Silicon Oxide Permeation Barrier Coating and Plasma Sterilization of PET Bottles and Foils

Silicon Oxide Permeation Barrier Coating and Plasma Sterilization of PET Bottles and Foils

Permeation mechanisms of pulsed microwave plasma deposited silicon oxide films for food packaging applications

Scalable Microwave Plasma Sources From Low to Atmospheric Pressure

Contact Info

Product

Resources

About