Hard TiCx/SiC/a-C:H nanocomposite thin films using pulsed high energy density plasma focus device

Umar, Zeshan Adeel; Rawat, Rajdeep Singh; Tan, Kelvin; Kumar, Aditya; Ahmad, Riaz; Hussain, Tousif; Kloc, Christian; Chen, Zhong; Shen, Lu; Zhang, Zheng

doi:10.1016/j.nimb.2013.03.007

Cited by 26 publications

(15 citation statements)

References 38 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The electrode system of UNU/ICTP PFF hosted in a steel chamber is energized by a single Maxwell fast discharging capacitor (30 µF, 15 kV) with a maximum energy up to 3.3 kJ. The details of UNU/ICTP PFF and its operation can be found elsewhere (12,21,22). The electrode system of UNU/ICTP PFF consists of a copper anode surrounded by six copper rods serving as cathodes and this electrode system is hosted in a steel chamber which is evacuated by a rotary van vacuum pump down to a pressure of 10 −2 mbar.…”

Section: Methodsmentioning

confidence: 99%

“…Figure 6 shows 3D topography of the exposed substrate for various (11,22 and 33) deposition shots along with the unexposed substrate. While the root mean square (RMS) roughness of substrates is determined by AFM and given in Figure 7.…”

Section: Atomic Force Microscopymentioning

confidence: 99%

“…The Nano Indenter XP ® MTS system is used to analyze the hardness (GPa) of the exposed substrate as a function of penetration depth. Figure 8 shows the hardness of the exposed substrate for various (11,22 and 33) deposition shots along with the unexposed substrate. The substrate sample exposed for 11 deposition shots shows a significant increase in the hardness as compared with the unexposed substrate, while the hardness of the exposed sample for 22 shots shows much greater hardness value at the surface of exposed samples and it decreases with the increase in depth.…”

Section: Mechanical Propertiesmentioning

confidence: 99%

See 2 more Smart Citations

A study of structural and mechanical properties of nano-crystalline tungsten nitride film synthesis by plasma focus

Hussnain

Rawat

Ahmad

et al. 2015

Radiation Effects and Defects in Solids

View full text Add to dashboard Cite

Nano-crystalline tungsten nitride thin films are synthesized on AISI-304 steel at room temperature using Mather-type plasma focus system. The surface properties of the exposed substrate against different deposition shots are examined for crystal structure, surface morphology and mechanical properties using X-ray diffraction (XRD), atomic force microscope, field emission scanning electron microscope and nanoindenter. The XRD results show the growth of WN and WN 2 phases and the development of strain/stress in the deposited films by varying the number of deposition shots. Morphology of deposited films shows the significant change in the surface structure with different ion energy doses (number of deposition shots). Due to the effect of different ion energy doses, the strain/stress developed in the deposited film leads to an improvement of hardness of deposited films.

show abstract

Section: Methodsmentioning

confidence: 99%

Section: Atomic Force Microscopymentioning

confidence: 99%

Section: Mechanical Propertiesmentioning

confidence: 99%

See 1 more Smart Citation

A study of structural and mechanical properties of nano-crystalline tungsten nitride film synthesis by plasma focus

Hussnain

Rawat

Ahmad

et al. 2015

Radiation Effects and Defects in Solids

View full text Add to dashboard Cite

show abstract

“…The result also highlights the high film deposition rate of 106.7 nm per plasma focus shot. However increase in film thickness with increasing number of focus shots is found to be non-linear which is attributed to the variation in focusing/pinching efficiency in each focus shot of plasma focus device [49,50].…”

Section: Sem Analysismentioning

confidence: 98%

Growth and Study of Plasma Assisted Nanostructured Hard Tantalum Nitride Thin Films

et al. 2015

View full text Add to dashboard Cite

Plasma assisted growth of tantalum nitride films in Mather type dense plasma focus device is reported in the current research. Effects of variation in number of plasma focus shots on structural, compositional and mechanical characteristics of synthesized tantalum nitride thin films have been investigated. Better crystallinity with thermally assisted coagulated growth patterns are observed for films synthesized by maximum (fifteen) plasma focus shots. Nano-hardness of films is observed to increase with increasing plasma focus shots whereas the maximum nanohardness of 16.24 ± 01.54 GPa is observed for film synthesized with fifteen plasma focus shots. Film roughness investigated by atomic force microscopy revealed influence of variation in plasma focus shots on surface roughness which is found to be increased with increase in plasma focus shots.

show abstract

“…The modified DPF device with suitable modification has been used worldwide for the fabrication of nanoparticles and nanostructures of different materials [ 1 , 2 , 3 , 4 , 5 , 6 , 7 , 8 , 9 , 10 , 11 , 12 , 13 , 14 , 15 , 16 , 17 , 18 , 19 , 20 , 21 ]. In most of these studies, the modification of anode is almost similar but the arrangement for placing the substrate varies.…”

Section: Introductionmentioning

confidence: 99%

Dense Plasma Focus-Based Nanofabrication of III–V Semiconductors: Unique Features and Recent Advances

2015

View full text Add to dashboard Cite

The hot and dense plasma formed in modified dense plasma focus (DPF) device has been used worldwide for the nanofabrication of several materials. In this paper, we summarize the fabrication of III–V semiconductor nanostructures using the high fluence material ions produced by hot, dense and extremely non-equilibrium plasma generated in a modified DPF device. In addition, we present the recent results on the fabrication of porous nano-gallium arsenide (GaAs). The details of morphological, structural and optical properties of the fabricated nano-GaAs are provided. The effect of rapid thermal annealing on the above properties of porous nano-GaAs is studied. The study reveals that it is possible to tailor the size of pores with annealing temperature. The optical properties of these porous nano-GaAs also confirm the possibility to tailor the pore sizes upon annealing. Possible applications of the fabricated and subsequently annealed porous nano-GaAs in transmission-type photo-cathodes and visible optoelectronic devices are discussed. These results suggest that the modified DPF is an effective tool for nanofabrication of continuous and porous III–V semiconductor nanomaterials. Further opportunities for using the modified DPF device for the fabrication of novel nanostructures are discussed as well.

show abstract

Hard TiCx/SiC/a-C:H nanocomposite thin films using pulsed high energy density plasma focus device

Cited by 26 publications

References 38 publications

A study of structural and mechanical properties of nano-crystalline tungsten nitride film synthesis by plasma focus

A study of structural and mechanical properties of nano-crystalline tungsten nitride film synthesis by plasma focus

Growth and Study of Plasma Assisted Nanostructured Hard Tantalum Nitride Thin Films

Dense Plasma Focus-Based Nanofabrication of III–V Semiconductors: Unique Features and Recent Advances

Contact Info

Product

Resources

About