Hardness and optical gap enhancement of germanium carbon films by nitrogen incorporation

Effect of deposition parameters on the microstructure and deposition rate of germanium-carbon coatings prepared by plasma enhanced chemical vapor deposition

“…Although up to now, some properties of germanium-carbon coatings prepared by the different method such as plasma enhanced chemical vapor deposition (PECVD) [8][9][10][11], X-ray chemical vapor deposition [12,13], RF co-sputtering [14][15][16], and RF reactive sputtering [17][18][19][20] have been studied, but such limited investigations are not enough for development of these coatings. Moreover, most researches have been conducted on structural and bonding characteristics of germanium-carbon coatings, but microscopic characterization of these coatings have not been fully investigated so far.…”