Helicon Plasma Discharge for Processing Wall Material

Abstract

A helicon wave plasma (HWP) discharge with strong magnetic field was investigated. The HWP was produced with an internal Nagoya III antenna that is perpendicular to the magnetic field and driven by a 13.56 MHz radio-frequency (RF) source. HWP was characterized in terms of electron density, electron temperature and plasma potential using a single Langmuir probe in Ar gas. The result of Langmuir probe shows that the electron density increases with RF power, but saturate above 700 W at a density of 2×1019m-3. Scanning electron microscopy (SEM) was extensively used to characterize the quality of the graphite surface. The result of SEM shows the surface of graphite that exposed to plasma processing has exhibited smoother and compacter surface topography. Meanwhile, the concentration of impurity on the graphite surface decreases with plasma processing.

Influence of magnetic field on power deposition in high magnetic field helicon experiment

“…[28][29][30] In HMHX, the magnitude of the magnetic field is controlled by the direct-current (DC) power supply. After calculation, it is found that the magnetic field strength is proportional to the current, and the proportional relationship satisfies the following relationship: [31] B = 1.4814 × 10 −3 I, (B in T, I in A) .…”

Laser induced fluorescence diagnostic for velocity distribution functions: applications, physics, methods and developments

“…More than half a century after the discovery of helicon waves [139,140], helicon plasma sources remained an important field of study in plasma physics. Their almost unique properties of producing very high plasma density up to 10 13 cm −3 , and electron temperature up to 10 eV [141] favor its application ranging from the study of planetary plasmas, to the recently popular study of wakefield accelerators [74,142] and to material processing applications [143]. Extensive research has been done on the propagation and absorption of helicon wave [144].…”