2016 21st International Conference on Ion Implantation Technology (IIT) 2016
DOI: 10.1109/iit.2016.7882875
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High & Low Dose USJ Implantation into Ge-Epi on Si Wafers: Dopant Activation, Damage Recovery and Mobility Effects

John Borland1,
M. Sugitani2,
Joshua Herman
3
et al.
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