High-Efficient Ultraviolet Photodetectors Based on TiO₂/Ag/TiO₂ Multilayer Films

Abstract

In this paper, the TiO 2 /Ag/TiO 2 (TAT) multilayer thin films were deposited on a corning glass substrate at room temperature using radio frequency magnetron sputtering technique. The TAT multilayer was characterized by field-emission scanning microscope, atomic force microscopy, X-ray diffraction, and ultraviolet (UV)-visible spectroscopy. The TAT multilayer can be optimized to obtain a transmittance more than 80%. With a 360-nm illumination and 5 V applied bias, it was found that the fabricated UV photodetectors (PDs) with TAT structure showed much higher photoresponse (10 A/W) than traditional TiO 2 metal-semiconductor-metal PDs (0.08 A/W). This indicated that the TAT multilayer structures have potential to be employed in the PD devices of high performance.

Characteristics of Ultraviolet Photodetector Based on Li-doped ZnO Nanorods

“…Various physical vapor deposition (PVD) methods have been reported for depositing ZnO, such as PLD, sputtering, and ion beam deposition, but only the sputtering method can generate a surface having a morphology close to that of a single crystal on an amorphous or low-temperature substrate. (19)(20)(21)(22) In this study, we address the synthesis of Li-doped ZnO NRs on a glass substrate by a radio frequency (RF)-magnetron-sputtering-assisted low-temperature hydrothermal method and the composition of NRs prepared at temperatures of 70, 80, and 90 ℃. We investigate the structural, morphological, and optical properties of the samples.…”