Graphene epitaxy on the Si face of a SiC wafer offers monolayer graphene with unique crystal orientation at the wafer-scale. However, due to carrier scattering near vicinal steps and excess bilayer stripes, the size of electrically uniform domains is limited to the width of the terraces extending up to a few microns. Nevertheless, the origin of carrier scattering at the SiC vicinal steps has not been clarified so far. A layer-resolved graphene transfer (LRGT) technique enables exfoliation of the epitaxial graphene formed on SiC wafers and transfer to flat Si wafers, which prepares crystallographically single-crystalline monolayer graphene. Because the LRGT flattens the deformed graphene at the terrace edges and permits an access to the graphene formed at the side wall of vicinal steps, components that affect the mobility of graphene formed near the vicinal steps of SiC could be individually investigated. Here, we reveal that the graphene formed at the side walls of step edges is pristine, and scattering near the steps is mainly attributed by the deformation of graphene at step edges of vicinalized SiC while partially from stripes of bilayer graphene. This study suggests that the two-step LRGT can prepare electrically single-domain graphene at the wafer-scale by removing the major possible sources of electrical degradation.epitaxial graphene | single domain | single crystal | carrier transport S ince the first discovery of graphene (1), its outstanding properties have drawn a great deal of attention (2-11). Among the methods to synthesize large-scale graphene (12)(13)(14), the growth of epitaxial graphene on a SiC wafer has been investigated as one of the most promising methods. Specifically, graphene growth on the Si face of a SiC (0001) wafer offers unique crystallographic orientation and monolayer controllability at the wafer-scale via a selflimiting sublimation of Si (15-18). However, graphene formed near SiC vicinal steps exhibits high resistance; thus, the region of graphene demonstrating high uniform carrier mobility is limited to the size of the terrace on a SiC substrate (19-23). The resistivity jump at the 10-nm-high single step on a SiC substrate was reported to be 21 kΩ·μm (21), whereas the intergrain resistivity from chemical vapor deposition (CVD)-grown polycrystalline graphene is measured to be 5 kΩ/sq (24). Thus, the use of this oriented graphene on SiC has been less favored over the use of CVD-grown polycrystalline graphene because the practical domain size of oriented graphene is much smaller than that of CVDgrown graphene (typically ranging from tens to hundreds of microns) (25). To overcome the limitation of graphene grown on SiC substrates, it is necessary to elucidate the cause of carrier scattering near vicinal steps and progress toward removing the factors causing this phenomena. However, the cause of enhanced carrier scattering in graphene near the SiC vicinal steps has not been fully understood yet. This is mainly due to the difficulty of resolving the complicated form of graphene near t...