2018
DOI: 10.1088/2058-6272/aa9e48
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High power impulse magnetron sputtering and its applications

Abstract: High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhan… Show more

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Cited by 14 publications
(5 citation statements)
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“…For region I, the shift in peak position to higher angle can be explained in light of results presented by Kubart et al [34] which show that at high repetition frequency the reduction in gas density is lower due to lower peak current (see figure 1(b)). The resulting effect is a more pronounced possibility towards target poisoning at low f R , which has been supported by results from [35,36], i.e. with increased time between pulses (i.e.…”
Section: Structural Characterizationsupporting
confidence: 55%
“…For region I, the shift in peak position to higher angle can be explained in light of results presented by Kubart et al [34] which show that at high repetition frequency the reduction in gas density is lower due to lower peak current (see figure 1(b)). The resulting effect is a more pronounced possibility towards target poisoning at low f R , which has been supported by results from [35,36], i.e. with increased time between pulses (i.e.…”
Section: Structural Characterizationsupporting
confidence: 55%
“…Over the last ten years, high-power impulse magnetron sputtering (HiPIMS) (Figure 3) has gained interest as a coating deposition technique due to its improvements over conventional PVD techniques producing better-quality films. The main benefits of the process are the formation of highly dense single-phase films with good substrate adhesion and low surface roughness [31]. HiPIMS is a line-of-sight deposition process whereby sputtering of a source occurs in a magnetic field with a high degree of ionization, allowing more collisions to take place near the substrate, forming high purity films.…”
Section: High-power Impulse Magnetron Sputtering (Hipims)mentioning
confidence: 99%
“…In terms of the principles of technologies as PVD, DCMS (Direct Current Magnetron Sputtering), HiPIMS (High Power Impulse Magnetron Sputtering) the range of materials and the structure of PVD coatings, the changes made more sophisticated and are not jumping in the short term. This means that changes have a life cycle character and the structures used and their material composition are significantly timeless [1][2][3][4].…”
Section: Introductionmentioning
confidence: 99%