2005
DOI: 10.1109/tnano.2005.847034
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High-Resolution Electron Beam Lithography and DNA Nano-Patterning for Molecular QCA

Abstract: Abstract-Electron beam lithography (EBL) patterning of poly(methylmethacrylate) (PMMA) is a versatile tool for defining molecular structures on the sub-10-nm scale. We demonstrate lithographic resolution to about 5 nm using a cold-development technique. Liftoff of sub-10-nm Au nanoparticles and metal lines proves that cold development completely clears the PMMA residue on the exposed areas. Molecular liftoff is performed to pattern DNA rafts with high fidelity at linewidths of about 100 nm. High-resolution EBL… Show more

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Cited by 76 publications
(35 citation statements)
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“…At equal crosstalk levels, the QD devices may be spaced more closely at a factor of 0.39 less than 200 nm wide dielectric structures [50]. [52]. Additionally, creating multiple type QD devices through the method can take place by conjugating streptavidin coated QDs to biotinylated complementary DNA strands prior to assembly with a base DNA linked to the surface.…”
Section: Gain Modelingmentioning
confidence: 99%
“…At equal crosstalk levels, the QD devices may be spaced more closely at a factor of 0.39 less than 200 nm wide dielectric structures [50]. [52]. Additionally, creating multiple type QD devices through the method can take place by conjugating streptavidin coated QDs to biotinylated complementary DNA strands prior to assembly with a base DNA linked to the surface.…”
Section: Gain Modelingmentioning
confidence: 99%
“…DNA hybridization between circuitboards will maintain subnm registry from one circuitboard to the next. [6] shows that silicon is a viable substrate for guided DNA tile binding.…”
Section: Guided Self-assembly For Systemsmentioning
confidence: 99%
“…In Section 4, we present simulation results that look at fundamental logic structures needed for a functionally complete logic set. In Section 5 we consider logic in the context of the device of [9,19] and the DNA-based scaffolding discussed in [6]. We conclude in Section 6.…”
Section: Introductionmentioning
confidence: 99%
“…PMMA ͑polymethylmethacrylate͒ is an important polymer because of its wide use as an electron resist for high resolution lithography [14][15][16][17][18][19] for forming patterns for microand nanodevices. Gold has been used as a dopant metal species for PMMA doping but not by using ion implantation as the doping mechanism.…”
Section: Introductionmentioning
confidence: 99%