High-threshold fluoride AR coatings for KDP crystal at 352 nm

Abstract

The laser damage thresholds and other properties of 352nm fluoride AR coatings for KDP substrate were investigated. The HoF3(or LaF3)/A1F3 AR coating deposited by lAD process had high threshold of 211J/cm2 (iOns) when laser conditioning procedure was used. These fluoride ARs were durable for wipping and also did not degraded during more one year under room atmosphere.