2021
DOI: 10.1016/j.corsci.2021.109476
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High vacuum arc ion plating Cr films: Self-ion bombarding effect and oxidation behavior

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Cited by 19 publications
(4 citation statements)
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“…The preferred orientation is a common phenomenon of physical vapour-deposited coatings. The deposition parameters affect the growth process, and then affect its crystal orientation [4547]. When the bias voltage is raised, the value of TC (200) decreases, while the value of TC (220) increases.…”
Section: Resultsmentioning
confidence: 99%
“…The preferred orientation is a common phenomenon of physical vapour-deposited coatings. The deposition parameters affect the growth process, and then affect its crystal orientation [4547]. When the bias voltage is raised, the value of TC (200) decreases, while the value of TC (220) increases.…”
Section: Resultsmentioning
confidence: 99%
“…The probable reason for the distinct oxidation behavior of the Cr coatings with and without orientations might be the oriented growth of the Cr 2 O 3 scales. [36] Considering the growth process and protective mechanism of the Cr 2 O 3 scale on the surface of Cr coating during high-temperature steam oxidation are very complex, more comprehensive analysis and research are needed in the future.…”
Section: High-temperature Steam Oxidation Behaviormentioning
confidence: 99%
“…Some dripping particles were detected on the Cr coating surface prepared by AIP, and most of the particles were smaller than 5 μm, which was related to the AIP deposition process. [21,22] Figure 2b shows the surface roughness of the Cr coating. The average value of surface roughness was approximately 0.458 μm.…”
Section: Microstructurementioning
confidence: 99%