2023
DOI: 10.1063/5.0127505
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High voltage nanosecond pulse generator based on pseudospark switch and diode opening switch

Abstract: With the development of technology, low-temperature plasma plays an increasingly important role in industrial applications. The industrial application of low-temperature plasma has the following requirements for plasma, high electron energy, low macroscopic temperature, and uniformity. Low-temperature plasma driven by nanosecond pulses reflects more significant advantages in these aspects compared to direct current plasma and alternating current plasma. In this paper, a simple topology is proposed, which is ba… Show more

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Cited by 4 publications
(1 citation statement)
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“…The domain of Pulsed Power (PP) refers to technologies where energy is accumulated during a relatively long period of time and then released in a short period, in the form of pulses, to deliver a very large amount of power to a given load or in other words to a given application. Since their establishment in the 1960s, these technologies have found applications in various domains and have now become one of the rapidly growing areas of research [1][2][3][4][5][6][7][8][9]. This is principally due to the fact that these pulses have relatively low energy content though they are capable of delivering very high levels of power.…”
Section: Introductionmentioning
confidence: 99%
“…The domain of Pulsed Power (PP) refers to technologies where energy is accumulated during a relatively long period of time and then released in a short period, in the form of pulses, to deliver a very large amount of power to a given load or in other words to a given application. Since their establishment in the 1960s, these technologies have found applications in various domains and have now become one of the rapidly growing areas of research [1][2][3][4][5][6][7][8][9]. This is principally due to the fact that these pulses have relatively low energy content though they are capable of delivering very high levels of power.…”
Section: Introductionmentioning
confidence: 99%