“…13 The composition of metal oxides is simple, easy to prepare, and compatible with complementary metal oxide semiconductor (CMOS) devices. 14 In addition, there are solid electrolyte materials with lattice defects and rapid ion migration, such as Ag 2 S, 15 SiO 2 , [16][17][18] and Cu 2 S. 19 Besides, organic materials with good flexibility and low cost, such as PVP, 20 PMMA, 21 and PFO, 22 have also been used to prepare memristive devices. Nowadays, the preparation of memristive devices can be achieved using many physical and chemical methods, such as atomic layer deposition, spin-coating method, magnetron sputtering, sol-gel method, pulsed laser deposition, and so on.…”