Hydrogen and nitrogen effects on optical and structural properties of amorphous carbon

Gharbi, R.; Fathallah, M.; Alzaied, N.; Tresso, Elena Maria; Tagliaferro, Alberto

doi:10.1016/j.msec.2007.10.022

Cited by 21 publications

(4 citation statements)

References 14 publications

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“…As far as magnetic storage field is concerned, higher storage densities require the read/write head to approach closer to the magnetic layer, so it is expected to develop even thinner ta-C films of 1-2 nm thickness and still with excellent tribological protection and corrosion resistance [6]. The incorporation of certain chemical elements into ta-C films including nitrogen has been found to improve effectively their structures and properties [7][8][9][10][11], such as internal thermal stress and thermal stability, optical absorption, electronic conductivity and mechanical hardness, thus greatly necessitate and broaden their application fields.…”

Section: Introductionmentioning

confidence: 99%

“…However, it has been mainly reported by some research groups for the nitrogen incorporation into ultra-thin ta-C films during direct FCVA deposition process [4,10,13], and the incorporation behavior has remained inefficient because the appealing diversity of the bonding configurations allows nitrogen to be incorporated in many conditions [8,14].…”

Section: Introductionmentioning

confidence: 99%

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Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Wang

Zhang

Zhou

et al. 2010

Applied Surface Science

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Wang

Zhang

Zhou

et al. 2010

Applied Surface Science

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“…Thus, since the localized electrons play an important role in determining the optical properties of a-C, due to the reduced spatial overlapping of and states wave overlapping, the contribution of -Ã and -Ã can be neglected. 21,22) The optical band gap of our a-C thin film was deduced using the Tauc plot 23) as shown in Fig. 8 in the absorption region ( $ 10 3 -10 4 cm À1 ).…”

Section: Resultsmentioning

confidence: 99%

Amorphous Carbon Deposited by a Novel Aerosol-Assisted Chemical Vapor Deposition for Photovoltaic Solar Cells

Ahmad

Kamaruzzaman

Rusop

2012

Jpn. J. Appl. Phys.

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The linear curve-crossing problem involving a slanted potential and a set of horizontal ones as an exactly soluble quantum-mechanical problem, is re-examined. Special attention is paid to the questions of degeneracy of the horizontal-potential channels. It is shown, by explicit derivation of an asymptotic expansion of the scattering amplitudes, that the degeneracy limit is a singular point. An explicit exact solution is derived for the degenerate case, resulting in a non-Landau-Zener saturated behaviour of the transition probabilities at high coupling intensities. Estimates are derived for the transition region as a function of the energy gap, and its divergence on approach to degeneracy. Relevance to the optical shielding of ultracold atom collisions is pointed out, with particular reference to the phenomenon of 'counterintuitive' transitions which were discussed recently.

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“…On the other hand, a-C contains high concentration of dangling bonds, which will affect the band gap value. Thus, since the localized π electrons play an important role in determining the optical properties of a-C, due to the reduced spatial overlapping of π and σ states wave overlapping, the contribution of σ-π* and π-σ* can be neglected [23,24].…”

mentioning

confidence: 99%

Influence of Deposition Time on Amorphous Carbon Thin Films Performance with Aerosol-Assisted Chemical Vapor Deposition

Fadzilah

Kamaruzaman

Siran³

et al. 2013

AMR

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Pure amorphous Carbon (a-C) thin films had been deposited by Aerosol-Assisted CVD (AACVD) onto glass substrate in Argon atmosphere. The camphor oil was chosen as the carbon precursor to prepare the a-C thin films with the deposition time of 15 minutes, 30 minutes, 45 minutes, 60 minutes and 75 minutes. The electrical, optical and structural properties of the deposited a-C were discussed by using the current-voltage solar simulator system, UV-Vis-Nir spectrophotometer and Raman spectroscope respectively. For the electrical characterization, the samples showed the photoresponse performance when being illuminated under AM 1.5 illuminations: 100 mW/cm2, 25°C. Transmittance value for the a-C thin films was also considered high ~80% and the structural analysis by using Raman spectroscope exhibit two main peaks known as the D-peak and G-peak which is typical for the a-C.

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Hydrogen and nitrogen effects on optical and structural properties of amorphous carbon

Cited by 21 publications

References 14 publications

Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Amorphous Carbon Deposited by a Novel Aerosol-Assisted Chemical Vapor Deposition for Photovoltaic Solar Cells

Influence of Deposition Time on Amorphous Carbon Thin Films Performance with Aerosol-Assisted Chemical Vapor Deposition

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