2022
DOI: 10.1007/s12633-022-01989-w
|View full text |Cite
|
Sign up to set email alerts
|

Impact of Gate Length and Doping Variation on the DC and Analog/RF Performance of sub - 3nm Stacked Si Gate-All-Around Nanosheet FET

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
3
2

Relationship

0
5

Authors

Journals

citations
Cited by 6 publications
references
References 42 publications
0
0
0
Order By: Relevance