Importance of the inherent and the relative surface energies in generating patterned layer in a solution process

Contact line curvature-induced molecular misorientation of a surface energy patterned organic semiconductor in meniscus-guided coating

“…Patterning of OSC thin films plays a significant role in the improvement of the electrical characteristics of OTFTs. Confinement of the OSCs through patterning suppresses leakage currents and crosstalk effect in integrated circuits, thus yielding more accurate TFT drive and lower power consumption [16][17][18] . These positive attributes have driven the development of various patterning methods for selective deposition of semiconductor thin films.…”

“…Photolithography, template guided patterning, stamping, and chemical patterning have been introduced to pattern soluble OSCs [19][20][21] . In particular, chemical patterning that induces hydrophobic and hydrophilic region selectively through self-assembled monolayer formation or surface terminal group control has been widely studied due to its merits [16][17][18]21 . It is a facile method that does not require conventional photolithography and is not area constrained.…”

“…For chemical patterning of the TIPS-pentacene, hydrophobic regions were generated through polydimethylsiloxane (PDMS) attachment on c-PVP and heated for 10 min at 120 °C. In this step, the methyl group, which is the surface terminal group of PDMS, was transferred onto the c-PVP insulator 18 . To remove the methyl groups and generate the hydrophilic regions selectively, a shadow metal mask covered c-PVP surface was exposed to ultraviolet-ozone (UVO) for 10 min.…”

“…To remove the methyl groups and generate the hydrophilic regions selectively, a shadow metal mask covered c-PVP surface was exposed to ultraviolet-ozone (UVO) for 10 min. The detailed principles and the process of chemical patterning used in this study were described in our previous study 18 . Figure 1(b) describes the patterning process of TIPS-pentacene solution.…”