2022
DOI: 10.1021/acsaem.1c04007
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Improved Performance of GaN Photoelectrodes from the Facile Fabrication of a Binder-Free Catalyst: Ni(OH)2 Nanosheets

Abstract: In this work, photoelectrochemical (PEC) reactions were carried out using n-GaN-based photoelectrodes in NaCl electrolytes. During the PEC reactions, the surface of bare n-GaN often gets rough, resulting in more surface defects. As a result, photogenerated carrier recombination with the defects at the n-GaN surface and the photocorrosion of n-GaN photoelectrodes occur simultaneously. Therefore, Ni­(OH)2 nanosheets prepared by a low-cost hydrothermal technique were coated on the n-GaN surface to passivate the s… Show more

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Cited by 4 publications
(5 citation statements)
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“…The NiO thickness employed in this study was estimated to be around 3 nm. For the synthesis of Ni­(OH) 2 , NiCl 2 (0.117g) and urea (0.1 g) were dissolved in 40 mL of DI water and stirred for 60 min to form the precursor solution . Subsequently, the NiO/In x Ga 1– x N samples and the bare InGaN samples were immersed in precursor solutions and placed in an autoclave at 180 °C for 120 min.…”
Section: Methodsmentioning
confidence: 99%
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“…The NiO thickness employed in this study was estimated to be around 3 nm. For the synthesis of Ni­(OH) 2 , NiCl 2 (0.117g) and urea (0.1 g) were dissolved in 40 mL of DI water and stirred for 60 min to form the precursor solution . Subsequently, the NiO/In x Ga 1– x N samples and the bare InGaN samples were immersed in precursor solutions and placed in an autoclave at 180 °C for 120 min.…”
Section: Methodsmentioning
confidence: 99%
“…For the synthesis of Ni(OH) 2 , NiCl 2 (0.117g) and urea (0.1 g) were dissolved in 40 mL of DI water and stirred for 60 min to form the precursor solution. 19 Subsequently, the NiO/In x Ga 1−x N samples and the bare InGaN samples were immersed in precursor solutions and placed in an autoclave at 180 °C for 120 min. This allowed the growth of Ni(OH) 2 nanosheets on the surface of the In x Ga 1−x N films.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
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“…PEC reactions conducted using n-gallium nitride (GaN) epitaxial films as working electrodes (WEs) have at least one advantage in that GaN is considerably resistant to acidic or alkaline electrolytes compared with Si and GaAs. In addition, it possesses an appropriate band position to propel the hydrogen evolution reaction and oxygen evolution reaction simultaneously. , Meanwhile, the bandgap of GaN-based semiconductors can be tailored by incorporating indium (In) into Ga 1– x In x N and thereby have a more efficient photoresponse to solar radiation. Nevertheless, high-quality and sufficiently thick Ga 1– x In x N films are difficult to grow on substrates (e.g., GaN or sapphire). Given the large lattice mismatch between GaN and Ga 1– x In x N, numerous structural defects, such as dislocations, are produced in the films during the epitaxial growth.…”
Section: Introductionmentioning
confidence: 99%