2022
DOI: 10.1016/j.ijleo.2022.169491
|View full text |Cite
|
Sign up to set email alerts
|

In situ spectral reflectance analysis of the early stages of GaN thermal decomposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
2

Relationship

1
1

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 39 publications
0
2
0
Order By: Relevance
“…Afterward, a 0.7-μm thick-GaN template was deposited at 1080°C, followed by the growth of 0.4-μm thick AlGaN epilayer. The layer thicknesses of the GaN-template and AlGaN active layer were determined using in-situ reflectivity during the growth process 30 32 More detail on the growth process can be found in Refs.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Afterward, a 0.7-μm thick-GaN template was deposited at 1080°C, followed by the growth of 0.4-μm thick AlGaN epilayer. The layer thicknesses of the GaN-template and AlGaN active layer were determined using in-situ reflectivity during the growth process 30 32 More detail on the growth process can be found in Refs.…”
Section: Methodsmentioning
confidence: 99%
“…The layer thicknesses of the GaN-template and AlGaN active layer were determined using in-situ reflectivity during the growth process. [30][31][32] More detail on the growth process can be found in Refs. 4, 29, 33, and 34. After growth, the AlGaN/GaN/sapphire sample, i.e., wafer, was divided into five pieces labeled as A 0 , A 1 , A 2 , A 3 , and A 4 .…”
Section: Methodsmentioning
confidence: 99%