2013 Third International Conference on Instrumentation, Measurement, Computer, Communication and Control 2013
DOI: 10.1109/imccc.2013.199
|View full text |Cite
|
Sign up to set email alerts
|

In-Situ Temperature Monitoring and Deposition Induced Errors Calibration in Metal-Organic Chemical Vapor Deposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
3
0

Year Published

2015
2015
2020
2020

Publication Types

Select...
2

Relationship

1
1

Authors

Journals

citations
Cited by 2 publications
(3 citation statements)
references
References 10 publications
0
3
0
Order By: Relevance
“…Consequently, emissivity-compensated pyrometry, which combines reflectometry and pyrometry, is a suitable in situ temperature probe. [7][8][9][10][11][12][13][14] Various calibration methods have been used to correct reactor-to-reactor temperature variations caused by optical adjustments of the probe, viewport geometry, and other equipment parameters.…”
Section: Downloaded By [Texas a And M International University] At 04:3mentioning
confidence: 99%
See 1 more Smart Citation
“…Consequently, emissivity-compensated pyrometry, which combines reflectometry and pyrometry, is a suitable in situ temperature probe. [7][8][9][10][11][12][13][14] Various calibration methods have been used to correct reactor-to-reactor temperature variations caused by optical adjustments of the probe, viewport geometry, and other equipment parameters.…”
Section: Downloaded By [Texas a And M International University] At 04:3mentioning
confidence: 99%
“…show uncorrected temperatures, while the red solid circles represent measurements corrected by equation (13). The error bars were estimated from the standard deviation of multiple measurements on ten wafers on the outer ring of the susceptor.…”
Section: Errors During Epitaxial Growthmentioning
confidence: 99%
“…A fine-grained temperature monitoring system for sustainable geothermal drill holes examined by Cozzini demonstrated an installation of an accurate and stable temperature monitoring system in a geothermal drill hole [7]. Temperature monitoring and temperature deposition induced calibration of errors in chemical-organic chemical vapor deposition carried out by Yan showed that in the process of semiconductor coating growth by metal-organic chemical vapor deposition (MOCVD), temperature measurement errors occurred due to deposition at the reactor display port [8]. Ali accomplished on accessing on-chip temperature health monitors using the IEEE 1687 standard using three temperature monitors together with an IJTAG controller online temperature measurements using the IJTAG network interface [9].…”
Section: Introductionmentioning
confidence: 99%