2018
DOI: 10.1016/j.carbon.2018.02.042
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Influence of an Al2O3 interlayer in a directly grown graphene-silicon Schottky junction solar cell

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Cited by 82 publications
(71 citation statements)
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“…However, the inhomogeneous thin insertion layers may weaken the protection effect. Therefore, ALD‐grown high‐ k dielectric materials (such as Al 2 O 3 and HfO 2 ) on Si substrate would be a better option for eliminating the dangling bonds on Si surface and preventing the direct exposure to air. Nanometer thick, condensed high‐ k dielectric oxide can effectively block oxygen from reaching the Si surface, and offers the modest tunneling barrier against reverse current.…”
Section: Discussionmentioning
confidence: 99%
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“…However, the inhomogeneous thin insertion layers may weaken the protection effect. Therefore, ALD‐grown high‐ k dielectric materials (such as Al 2 O 3 and HfO 2 ) on Si substrate would be a better option for eliminating the dangling bonds on Si surface and preventing the direct exposure to air. Nanometer thick, condensed high‐ k dielectric oxide can effectively block oxygen from reaching the Si surface, and offers the modest tunneling barrier against reverse current.…”
Section: Discussionmentioning
confidence: 99%
“…Al 2 O 3 layer grown with atomic layer deposition (ALD) has proved to offer excellent surface passivation. Therefore, Ahn et al and Rehman et al introduced ALD‐grown Al 2 O 3 layer into Gr–Si interface for optimization. Similar to SiO 2 layer, Al 2 O 3 layer reduced the recombination at the Gr–Si surface and improved V OC and FF of Gr–Si solar cells.…”
Section: Engineering Gr/si Solar Cellsmentioning
confidence: 99%
“…First, the ALD layer acts as either carrier selective transport layer or charge blocking layer: the former contributes to higher photocurrent because of the higher carrier collection efficiency; the latter significantly reduces dark current and contributes to the enhanced detection limits. For example, Rehman et al has reported that the introduction ALD‐Al 2 O 3 layer between Si/graphene heterojunction can blocks electron transport and reduces carrier recombination . Second, the introduction of ALD layer can reduce the defects in perovskite thin films and improve their film quality.…”
Section: Performance Comparison Of Self‐powered Pds Based On Hybrid Pmentioning
confidence: 99%
“…(2) The absorbed photon number is reduced by the planar Si wafers which is 30-40% for visible light (350-800 nm). 44 Aer graphene/Si solar cells was reported in 2010, 23 lots of methods are developed to tune the work function and conductivity of graphene and the reectance Si wafers, such as chemical doping, [45][46][47][48][49][50] increasing layer number of graphene 51,52 and introducing an interlayer, [53][54][55][56][57][58][59] all of which can help to optimize the performance of solar cells signicantly.…”
Section: The Optimization Of Graphene/si Solar Cellsmentioning
confidence: 99%