Abstract:Radiofrequency (RF) reactive magnetron sputtering was used to deposit thin SiCN and CrSiCN films on high-speed steel or silicon substrates. Nanoindentation, scanning electron microscopy/energy dispersive X-ray spectroscopy (SEM-EDS), transmission electron microscopy (TEM), and X-ray photoelectron spectroscopy (XPS) analyses were used to investigate the changes in the mechanical properties and microstructure of the CrSiCN films after annealing. The CrSiCN (37.6%Cr) film deposited on the Si substrate showed litt… Show more
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