Influence of layer type and order on barrier properties of multilayer PECVD barrier coatings

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD

“…The development of the PEALD process for Al 2 O 3 and SiO 2 from the precursors TMA and BDEAS was investigated in terms of saturation studies (thin film thickness as a function of precursor pulse length) and linearity by employing in situ quartz crystal microbalance (QCM) experiments and is discussed in detail in the Supporting Information (Figure S1). The fabrication of the investigated PECVD thin films of SiO x C y H z and SiO x was previously reported …”

“…During the initial steps of deposition, the surface chemistry of the polymer is also influenced . Furthermore, the chemical structure of the deposited inorganic thin films and hence barrier performance can change . Interactions with oxygen in particular, are known to trigger degradative processes at the interface which influences the formation and cross‐linking of the barrier film .…”

“…Furthermore, the chemical structure of the deposited inorganic thin films and hence barrier performance can change . Interactions with oxygen in particular, are known to trigger degradative processes at the interface which influences the formation and cross‐linking of the barrier film . For example, the interface of a polymer and a growing thin film is known to be comprised of a mixture of coating species and etched polymer products .…”

“…As the surface condition is crucial for the development of defects as well, this could potentially result in an increased defect density. Since the transport of permeants through polymers and applied GBL coatings is strongly dependent on defect density and defect size, gas barrier properties can be improved most efficiently by the deposition of highly cross‐linked, dense, and defect‐free thin films. In this context, plasma‐enhanced atomic layer deposition (PEALD) is a promising deposition technique to achieve superior thin film qualities for different oxide materials like Al 2 O 3 , SiO 2 , TiO 2 , HfO 2 , and ZrO 2 , which have been successfully applied as GBLs .…”

Barriereausrüstung von Kunststoffen mittels PECVD

“…2 (links) ist eine FESEM-Aufnahme der Sperrschicht dargestellt. Bei der Sperrschicht handelt es sich um eine SiO x C y H z -Schicht mit sehr geringem Kohlenwasserstoffanteil, wie Untersuchungen der Oberflächenchemie gezeigt haben [8], insbesondere im Vergleich mit der Pufferschicht. Diese wird daher im Folgenden als SiO x -bzw.…”