Influence of Processing Conditions on the Structure of Strontium Titanate Thin Films Grown on Si by Laser Mbe

Abstract

Epitaxial SrTiO 3 thin films have been deposited on Si (100) substrates by laser molecularbeam epitaxy. The experiments have confirmed that the use of Sr buffer layer is essential for making high quality SrTiO 3 film. Apart from this, processing parameters including the deposition temperature and time for each layer also have significant influence on the crystallinity and roughness of SrTiO 3 . The thin films prepared under optimized conditions were found to have a pure perovskite phase, well crystallized and epitaxially aligned. The electrical measurements indicate that the SrTiO 3 film has a capacitance effective thickness of less than 16Å.