“…[16][17][18] To date, however, the practical device applications of InN-based materials have been severely limited by the presence of extremely large residual electron density and the uncontrolled surface charge properties, as well as the difficulty in achieving p-type conductivity. 8,[19][20][21][22][23][24][25][26][27][28][29][30] For example, in general, the currently reported nominally undoped InN is n-type degenerate, with the residual electron densities in the range of ∼ 1 × 10 18 cm −3 , or higher. 8,11,25,[31][32][33][34] Moreover, it has been generally observed that there exists a very high electron concentration (∼ 1 × 10 13−14 cm −2 ) at both the polar and nonpolar grown surfaces of InN films, 19,35 and the Fermi-level (E F ) is pinned deep into the conduction band at the surfaces; 19,20,29,30 similar electron accumulation profile has also been measured at the lateral nonpolar grown surfaces of [0001]-oriented wurtzite InN nanowires.…”