INTEGRATED OPTICAL WAVEGUIDES BASED ON Si3N4 FILMS

Abstract

The paper presents studies at developing a technology for the formation of a rib integrated optical waveguide based on a Si3N4 film. The effect of ICP deposition modes on the structure of SiO2 and Si3N4 films and the effects of RIE etching of the waveguide on the rib profile and surface roughness are studied.