2014
DOI: 10.1002/sia.5633
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Interface characterization of nitrogen plasma‐treated gate oxide film formed by RTP technology

Abstract: We described thin nitrogen plasma-treated gate oxide film formed by rapid thermal process technology. This thin nitrogen plasma-treated gate oxide film has been formed using remote plasma nitridation process onto in situ steam generated oxide layer. We investigated the nitrogen profile within the gate dielectric film formed by this technique using SIMS analysis. The result shows that nitrogen concentration profile is composed of high at top surface and low at SiO 2 /Si interface. The peak concentration of nitr… Show more

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